SCOPUS 정보 검색 플랫폼

Applied Physics A: Materials Science and Processing

Volumn 96, Issue 2, 2009, Pages 529-533

Transparence and electrical properties of ZnO-based multilayer electrode

(5) Kao, Kuo Sheng a Chang, Shang Hao a Hsieh, Po Tsung b Wang, Chih Ming c Cheng, Da Long a

a SHU TE UNIVERSITY (Taiwan)

b NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

c CHENG SHIU UNIVERSITY (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

DC MAGNETRON SPUTTERING; ELECTRICAL AND OPTICAL PROPERTIES; ELECTRICAL PROPERTY; ELECTRICAL RESISTIVITY; MULTILAYER ELECTRODES; OPTICAL TRANSMITTANCE; SOL-GEL METHODS; SOL-GEL TECHNIQUE; SPUTTERING TIME; TI THIN FILMS; ZNO; ZNO THIN FILM;

DEPOSITION; ELECTRIC NETWORK ANALYSIS; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; FILM THICKNESS; GELATION; GELS; METALLIC FILMS; MULTILAYER FILMS; MULTILAYERS; OPTICAL FILMS; OPTICAL MULTILAYERS; OPTICAL PROPERTIES; SEMICONDUCTING ZINC COMPOUNDS; SHEET RESISTANCE; SILVER; SILVER ALLOYS; SOL-GEL PROCESS; SOL-GELS; SOLS; SPUTTERING; THIN FILM DEVICES; TITANIUM; ZINC OXIDE;

FILM PREPARATION;

EID: 67650424022 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-009-5237-8 Document Type: Article

Times cited : (7)

References (23)

1
- 0042598063
- A. Klöppel W. Kriegseis B.K. Meyer A. Scharmann C. Daube J. Stollenwerk J. Trube 2000 Thin Solid Films 365 139
- (2000) Thin Solid Films , vol.365 , pp. 139
- A. Klöppel¹ Kriegseis, W.² Meyer, B.K.³ Scharmann, A.⁴ Daube, C.⁵ Stollenwerk, J.⁶ Trube, J.⁷

2
- 0035358905
- Y. Aoshima M. Miyazaki K. Sato Y. Akao S. Takaki K. Adachi 2001 Jpn. J. Appl. Phys. 40 4166
- (2001) Jpn. J. Appl. Phys. , vol.40 , pp. 4166
- Aoshima, Y.¹ Miyazaki, M.² Sato, K.³ Akao, Y.⁴ Takaki, S.⁵ Adachi, K.⁶

3
- 0035974513
- A. Klöppel B. Meyer J. Trube 2001 Thin Solid Films 392 311
- (2001) Thin Solid Films , vol.392 , pp. 311
- A. Klöppel¹ Meyer, B.² Trube, J.³

4
- 0041508135
- X. Liu X. Cai J. Qiao J. Mao N. Jiang 2003 Thin Solid Films 441 200
- (2003) Thin Solid Films , vol.441 , pp. 200
- Liu, X.¹ Cai, X.² Qiao, J.³ Mao, J.⁴ Jiang, N.⁵

5
- 54549118147
- T. Sakano H. Fukuoka Y. Yata T. Saiki M. Obara 2008 Appl. Phys. A: Mater. Sci. Process. 93 697
- (2008) Appl. Phys. A: Mater. Sci. Process. , vol.93 , pp. 697
- Sakano, T.¹ Fukuoka, H.² Yata, Y.³ Saiki, T.⁴ Obara, M.⁵

6
- 0035974452
- M. Fahland P. Karlsson C. Charton 2001 Thin Solid Films 392 334
- (2001) Thin Solid Films , vol.392 , pp. 334
- Fahland, M.¹ Karlsson, P.² Charton, C.³

7
- 33745870502
- S. Kobayakawa Y. Tanaka A. Ide-Ektessabi 2006 Nucl. Instrum. Methods Phys. Res. B 249 536
- (2006) Nucl. Instrum. Methods Phys. Res. B , vol.249 , pp. 536
- Kobayakawa, S.¹ Tanaka, Y.² Ide-Ektessabi, A.³

8
- 0026138897
- Y. Igasaki H. Saito 1991 Thin Solid Films 199 223
- (1991) Thin Solid Films , vol.199 , pp. 223
- Igasaki, Y.¹ Saito, H.²

9
- 0033354361
- T. Komaru S. Shimizu M. Kanbe Y. Maeda T. Kamiya C.M. Fortmann I. Shimizu 1999 Jpn. J. Appl. Phys. 38 5796
- (1999) Jpn. J. Appl. Phys. , vol.38 , pp. 5796
- Komaru, T.¹ Shimizu, S.² Kanbe, M.³ Maeda, Y.⁴ Kamiya, T.⁵ Fortmann, C.M.⁶ Shimizu, I.⁷

10
- 0036574570
- T.Y. Ma D.K. Shim 2002 Thin Solid Films 410 8
- (2002) Thin Solid Films , vol.410 , pp. 8
- Ma, T.Y.¹ Shim, D.K.²

11
- 0032482871
- M. Bender W. Seelig C. Daube H. Frankenberger B. Ocker J. Stollenwerk 1998 Thin Solid Films 326 72
- (1998) Thin Solid Films , vol.326 , pp. 72
- Bender, M.¹ Seelig, W.² Daube, C.³ Frankenberger, H.⁴ Ocker, B.⁵ Stollenwerk, J.⁶

12
- 0032628037
- K.H. Choi J.Y. Kim Y.S. Lee H.J. Kim 1999 Thin Solid Films 341 152
- (1999) Thin Solid Films , vol.341 , pp. 152
- Choi, K.H.¹ Kim, J.Y.² Lee, Y.S.³ Kim, H.J.⁴

13
- 36048953022
- I.V. Tudose P. Horváth M. Suchea S. Christoulakis T. Kitsopoulos G. Kiriakidis 2007 Appl. Phys. A: Mater. Sci. Process. 89 57
- (2007) Appl. Phys. A: Mater. Sci. Process. , vol.89 , pp. 57
- Tudose, I.V.¹ P. Horváth² Suchea, M.³ Christoulakis, S.⁴ Kitsopoulos, T.⁵ Kiriakidis, G.⁶

14
- 0035974452
- M. Fahland P. Karlsson C. Charton 2001 Thin Solid Films 392 334
- (2001) Thin Solid Films , vol.392 , pp. 334
- Fahland, M.¹ Karlsson, P.² Charton, C.³

15
- 0344118146
- E. Bertran C. Corbella M. Vives A. Pinyol C. Person I. Porqueras 2003 Solid State Ionics 165 139
- (2003) Solid State Ionics , vol.165 , pp. 139
- Bertran, E.¹ Corbella, C.² Vives, M.³ Pinyol, A.⁴ Person, C.⁵ Porqueras, I.⁶

16
- 0003696779
- Academic Press New York
- J.L. Vossen, Physics of Thin Films, vol. 9 (Academic Press, New York, 1977)
- (1977) Physics of Thin Films 9
- Vossen, J.L.¹

17
- 0042524650
- Y.S. Jung Y.W. Choi H.C. Lee D.W. Lee 2003 Thin Solid Films 440 278
- (2003) Thin Solid Films , vol.440 , pp. 278
- Jung, Y.S.¹ Choi, Y.W.² Lee, H.C.³ Lee, D.W.⁴

18
- 0032482832
- M. Bender W. Seelig C. Daube H. Frankenberger B. Ocker J. Stollenwerk 1998 Thin Solid Films 326 67
- (1998) Thin Solid Films , vol.326 , pp. 67
- Bender, M.¹ Seelig, W.² Daube, C.³ Frankenberger, H.⁴ Ocker, B.⁵ Stollenwerk, J.⁶

19
- 34250745125
- S.W. Chen C.H. Koo 2007 Mater. Lett. 61 4097
- (2007) Mater. Lett. , vol.61 , pp. 4097
- Chen, S.W.¹ Koo, C.H.²

20
- 34347339519
- P.T. Hsieh Y.C. Chen K.S. Kao M.S. Lee C.C. Cheng 2007 J. Eur. Cream. Soc. 27 3815
- (2007) J. Eur. Cream. Soc. , vol.27 , pp. 3815
- Hsieh, P.T.¹ Chen, Y.C.² Kao, K.S.³ Lee, M.S.⁴ Cheng, C.C.⁵

21
- 0041508135
- X. Liu X. Cai J. Qiao J. Mao N. Jiang 2003 Thin Solid Films 441 200
- (2003) Thin Solid Films , vol.441 , pp. 200
- Liu, X.¹ Cai, X.² Qiao, J.³ Mao, J.⁴ Jiang, N.⁵

22
- 0003680984
- McGraw-Hill New York
- L.I. Maissel, R. Glang, Handbook of Thin Film Technology (McGraw-Hill, New York, 1970)
- (1970) Handbook of Thin Film Technology
- Maissel, L.I.¹ Glang, R.²

23
- 0016992850
- G. Haacke 1976 J. Appl., Phys. 47 4086
- (1976) J. Appl., Phys. , vol.47 , pp. 4086
- Haacke, G.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.