-
2
-
-
77956788535
-
-
INSPEC, Institute of Electrical Engineers, New York EMIS Datareview Ser.
-
Adachi S. "Properties of Gallium Arsenide" 2 (1990), INSPEC, Institute of Electrical Engineers, New York 513-528 EMIS Datareview Ser.
-
(1990)
"Properties of Gallium Arsenide"
, vol.2
, pp. 513-528
-
-
Adachi, S.1
-
5
-
-
33646411298
-
-
Alferov Z.I., Andreev V.M., Korol'Kov V.I., Tretyakov D.N., and Tuchkevich V.M. Sov. Phys. Semicond. (Engl. Transl.) 1 (1967) 1313-1316
-
(1967)
Sov. Phys. Semicond. (Engl. Transl.)
, vol.1
, pp. 1313-1316
-
-
Alferov, Z.I.1
Andreev, V.M.2
Korol'Kov, V.I.3
Tretyakov, D.N.4
Tuchkevich, V.M.5
-
6
-
-
33646411298
-
-
Alferov Z.I., Andreev V.M., Korol'Kov V.I., Tret'Yakov D.N., and Tuchkevick V.M. Sov. Phys. Semicond. (Engl. Transl.) 1 (1968) 1313-1314
-
(1968)
Sov. Phys. Semicond. (Engl. Transl.)
, vol.1
, pp. 1313-1314
-
-
Alferov, Z.I.1
Andreev, V.M.2
Korol'Kov, V.I.3
Tret'Yakov, D.N.4
Tuchkevick, V.M.5
-
7
-
-
3843061320
-
-
Alferov Z.I., Andreev V.M., Korol'Kov V.I., Portnoi E.L., and Tret'Yakov D.N. Sov. Phys. Semicond. (Engl. Transl.) 2 (1969) 843-844
-
(1969)
Sov. Phys. Semicond. (Engl. Transl.)
, vol.2
, pp. 843-844
-
-
Alferov, Z.I.1
Andreev, V.M.2
Korol'Kov, V.I.3
Portnoi, E.L.4
Tret'Yakov, D.N.5
-
8
-
-
33646434862
-
-
Alferov Z.I., Andreev V.M., Korol'Kov V.I., Portnoi E.L., and Yakovenko A.A. Sov. Phys. Semicond. (Engl. Transl.) 3 (1969) 785-787
-
(1969)
Sov. Phys. Semicond. (Engl. Transl.)
, vol.3
, pp. 785-787
-
-
Alferov, Z.I.1
Andreev, V.M.2
Korol'Kov, V.I.3
Portnoi, E.L.4
Yakovenko, A.A.5
-
16
-
-
0029406848
-
-
Babic D.I., Streubal K., Mirin R.P., Margalit N.M., Bowers J.E., Hu E.L., Mars D.E., Yang L., and Carey K. IEEE Photon. Techno! Lett. 7 (1995) 1225-1227
-
(1995)
IEEE Photon. Techno! Lett.
, vol.7
, pp. 1225-1227
-
-
Babic, D.I.1
Streubal, K.2
Mirin, R.P.3
Margalit, N.M.4
Bowers, J.E.5
Hu, E.L.6
Mars, D.E.7
Yang, L.8
Carey, K.9
-
17
-
-
0004641991
-
-
Baldereschi A., Hess E., Maschke K., Neumann H., Schulze K.-R., and Unger K. J. Phys. C: Solid State Phys. 10 (1977) 4709-4717
-
(1977)
J. Phys. C: Solid State Phys.
, vol.10
, pp. 4709-4717
-
-
Baldereschi, A.1
Hess, E.2
Maschke, K.3
Neumann, H.4
Schulze, K.-R.5
Unger, K.6
-
18
-
-
0000420364
-
-
Bellon P., Chevalier J.P., Martin G.P., Dupont-Nivet E., Thiebaut C., and Andre J.P. Appl. Phys. Lett. 52 (1988) 567-569
-
(1988)
Appl. Phys. Lett.
, vol.52
, pp. 567-569
-
-
Bellon, P.1
Chevalier, J.P.2
Martin, G.P.3
Dupont-Nivet, E.4
Thiebaut, C.5
Andre, J.P.6
-
21
-
-
0000687871
-
-
Zory Jr. P.S. (Ed), Academic Press, Boston
-
Bour D.P. In: Zory Jr. P.S. (Ed). "Quantum Well Lasers" (1993), Academic Press, Boston 415-460
-
(1993)
"Quantum Well Lasers"
, pp. 415-460
-
-
Bour, D.P.1
-
24
-
-
0027595744
-
-
Bour D.P., Treat D.W., Thornton R.L., Geels R.S., and Welch D.F. IEEE J. Quantum Electron. 29 (1993) 1337-1343
-
(1993)
IEEE J. Quantum Electron.
, vol.29
, pp. 1337-1343
-
-
Bour, D.P.1
Treat, D.W.2
Thornton, R.L.3
Geels, R.S.4
Welch, D.F.5
-
26
-
-
0043118398
-
-
, G. B. Stringfellow, ed, Inst. Phys, Bristol
-
In "Proceedings of the 18th International Symposium on GaAs and Related Compounds" (G. B. Stringfellow, ed.), Vol. 120, pp. 529-534 Inst. Phys., Bristol.
-
(1992)
Proceedings of the 18th International Symposium on GaAs and Related Compounds
, vol.120
, pp. 529-534
-
-
Buchan, N.1
Heuberger, W.2
Jakubowicz, A.3
Roentgen, P.4
-
28
-
-
0042387205
-
-
Burnham R.D., Holonyak Jr. N., Keune D.L., Scifres D.R., and Dapkus P.D. Appl. Phys. Lett. 17 (1970) 430-432
-
(1970)
Appl. Phys. Lett.
, vol.17
, pp. 430-432
-
-
Burnham, R.D.1
Holonyak Jr., N.2
Keune, D.L.3
Scifres, D.R.4
Dapkus, P.D.5
-
30
-
-
77956744653
-
-
U.S. Pat.4,309,670
-
Burnham, R.D., Scifres, D.R. and Streifer, W., (1982). U.S. Pat.4,309,670
-
(1982)
-
-
Burnham, R.D.1
Scifres, D.R.2
Streifer, W.3
-
36
-
-
0039770805
-
-
, A. Christou, and H. S. Rupprecht, eds, Inst. Phys, Bristol
-
In "Proceedings of the 14th International Symposium on GaAs and Related Compounds" (A. Christou, and H. S. Rupprecht, eds.), Vol. 91, pp. 777-780. Inst. Phys., Bristol
-
(1988)
Proceedings of the 14th International Symposium on GaAs and Related Compounds
, vol.91
, pp. 777-780
-
-
Cook, L.W.1
Camras, M.D.2
Rudaz, S.L.3
Steranka, F.M.4
-
40
-
-
0000611936
-
-
Dallesasse J.M., Gavrilovic P., Holonyak Jr. N., Kaliski R.W., Nam D.W., and Vesely E.J. Appl. Phys. Lett. 56 (1990) 2436-2438
-
(1990)
Appl. Phys. Lett.
, vol.56
, pp. 2436-2438
-
-
Dallesasse, J.M.1
Gavrilovic, P.2
Holonyak Jr., N.3
Kaliski, R.W.4
Nam, D.W.5
Vesely, E.J.6
-
41
-
-
0000927668
-
-
Dallesasse J.M., El-Zein N., Holonyak Jr. N., Hsieh K.C., Burnham R.D., and Dupuis R.D. J. Appl Phys. 68 (1990) 2235-2238
-
(1990)
J. Appl Phys.
, vol.68
, pp. 2235-2238
-
-
Dallesasse, J.M.1
El-Zein, N.2
Holonyak Jr., N.3
Hsieh, K.C.4
Burnham, R.D.5
Dupuis, R.D.6
-
42
-
-
0004607079
-
-
Dallesasse J.M., Holonyak Jr. N., Sugg A.R., Richard T.A., and El-Zein N. Appl. Phys. Lett. 57 (1990) 2844-2846
-
(1990)
Appl. Phys. Lett.
, vol.57
, pp. 2844-2846
-
-
Dallesasse, J.M.1
Holonyak Jr., N.2
Sugg, A.R.3
Richard, T.A.4
El-Zein, N.5
-
43
-
-
0026414769
-
-
Domen K., Sugiura K., Anayama C., Kondo M., Sugawara M., Tanahashi T., and Nakajima K. J. Cryst. Growth 115 (1991) 529-532
-
(1991)
J. Cryst. Growth
, vol.115
, pp. 529-532
-
-
Domen, K.1
Sugiura, K.2
Anayama, C.3
Kondo, M.4
Sugawara, M.5
Tanahashi, T.6
Nakajima, K.7
-
44
-
-
3843050299
-
-
, T. Ikegami, F. Hasegawa, and Y. Takeda, eds, Inst. Phys, Bristol
-
In "Proceedings of the 19th International Symposium on GaAs and Related Compounds" (T. Ikegami, F. Hasegawa, and Y. Takeda, eds.), Vol.129, pp. 447-452. Inst. Phys., Bristol
-
(1993)
Proceedings of the 19th International Symposium on GaAs and Related Compounds
, vol.129
, pp. 447-452
-
-
Domen, K.1
Kondo, M.2
Tanahashi, T.3
-
46
-
-
0008881116
-
-
Dudley J.J., Ishikawa M., Babic D.I., Miller B.I., Mirin R., Jiang W.B., Bowers J.E., and Hu E.L. Appl. Phys. Lett. 61 (1992) 3095-3097
-
(1992)
Appl. Phys. Lett.
, vol.61
, pp. 3095-3097
-
-
Dudley, J.J.1
Ishikawa, M.2
Babic, D.I.3
Miller, B.I.4
Mirin, R.5
Jiang, W.B.6
Bowers, J.E.7
Hu, E.L.8
-
47
-
-
0028387897
-
-
Dudley J.J., Babic D.I., Mirin R., Yang L., Miller B.I., Ram R.J., Reynolds T., Hu E.L., and Bowers J.E. Appl. Phys. Lett. 64 (1994) 1463-1465
-
(1994)
Appl. Phys. Lett.
, vol.64
, pp. 1463-1465
-
-
Dudley, J.J.1
Babic, D.I.2
Mirin, R.3
Yang, L.4
Miller, B.I.5
Ram, R.J.6
Reynolds, T.7
Hu, E.L.8
Bowers, J.E.9
-
51
-
-
0029511778
-
-
Ejeckam F.E., Chua C.L., Zhu Z.H., Lo Y.H., Hong M., and Bhat R. Appl. Phys. Lett. 67 (1995) 3936-3938
-
(1995)
Appl. Phys. Lett.
, vol.67
, pp. 3936-3938
-
-
Ejeckam, F.E.1
Chua, C.L.2
Zhu, Z.H.3
Lo, Y.H.4
Hong, M.5
Bhat, R.6
-
52
-
-
0027808335
-
-
Feng S.L., Krynicki J., Donchev V., Bourgoin J.C., Forte-Poisson M.D., Brylinski C., Delage S., Blanck H., and Alaya S. Semicond. Sci. Technol. 8 (1993) 2092-2096
-
(1993)
Semicond. Sci. Technol.
, vol.8
, pp. 2092-2096
-
-
Feng, S.L.1
Krynicki, J.2
Donchev, V.3
Bourgoin, J.C.4
Forte-Poisson, M.D.5
Brylinski, C.6
Delage, S.7
Blanck, H.8
Alaya, S.9
-
53
-
-
0026372757
-
-
Fletcher R.M., Kuo C.P., Osentowski T.D., Huang K.H., Craford M.G., and Robbins V.M. J. Electron. Mater. 20 (1991) 1125-1130
-
(1991)
J. Electron. Mater.
, vol.20
, pp. 1125-1130
-
-
Fletcher, R.M.1
Kuo, C.P.2
Osentowski, T.D.3
Huang, K.H.4
Craford, M.G.5
Robbins, V.M.6
-
54
-
-
77956716865
-
-
U.S. Pat.5,008,718
-
Fletcher, R.M., Kuo, C.P., Osentowski, T.D. and Robbins, V.M., (1991b). U.S. Pat.5,008,718
-
(1991)
-
-
Fletcher, R.M.1
Kuo, C.P.2
Osentowski, T.D.3
Robbins, V.M.4
-
55
-
-
77956748159
-
-
Fletcher R.M., Kuo C.P., Osentowski T.D., Yu J.G., and Robbins V.M. Hewlett-Packard Journal 44 (1993) 6-14
-
(1993)
Hewlett-Packard Journal
, vol.44
, pp. 6-14
-
-
Fletcher, R.M.1
Kuo, C.P.2
Osentowski, T.D.3
Yu, J.G.4
Robbins, V.M.5
-
57
-
-
0000628748
-
-
Gomyo A., Kobayashi K., Kawata S., Hino I., and Suzuki T. J. Cryst. Growth 77 (1986) 367-373
-
(1986)
J. Cryst. Growth
, vol.77
, pp. 367-373
-
-
Gomyo, A.1
Kobayashi, K.2
Kawata, S.3
Hino, I.4
Suzuki, T.5
-
58
-
-
51149206925
-
-
Gomyo A., Suzuki T., Kobayashi K., Kawata S., Hino I., and Yuasa T. Appl. Phys. Lett. 50 (1987) 673-675
-
(1987)
Appl. Phys. Lett.
, vol.50
, pp. 673-675
-
-
Gomyo, A.1
Suzuki, T.2
Kobayashi, K.3
Kawata, S.4
Hino, I.5
Yuasa, T.6
-
60
-
-
0026170561
-
-
Hatakoshi G., Itaya K., Ishikawa M., Okajima M., and Uematsu Y. IEEE J. Quantum Electron. 27 (1991) 1476-1482
-
(1991)
IEEE J. Quantum Electron.
, vol.27
, pp. 1476-1482
-
-
Hatakoshi, G.1
Itaya, K.2
Ishikawa, M.3
Okajima, M.4
Uematsu, Y.5
-
62
-
-
0000539610
-
-
Hofler G.E., Vanderwater D.A., Defevere D.C., Kish F.A., Camras M.D., Steranka F.M., and Tan I.-H. Appl. Phys. Lett. 69 (1996) 803-805
-
(1996)
Appl. Phys. Lett.
, vol.69
, pp. 803-805
-
-
Hofler, G.E.1
Vanderwater, D.A.2
Defevere, D.C.3
Kish, F.A.4
Camras, M.D.5
Steranka, F.M.6
Tan, I.-H.7
-
64
-
-
0022026358
-
-
Honda M., Ikeda M., Mori Y., Kaneko K., and Watanabe N. Jpn. J. Appl. Phys. 24 (1985) L187-L189
-
(1985)
Jpn. J. Appl. Phys.
, vol.24
-
-
Honda, M.1
Ikeda, M.2
Mori, Y.3
Kaneko, K.4
Watanabe, N.5
-
65
-
-
0010436436
-
-
Huang K.H., Yu J.G., Kuo C.P., Fletcher R.M., Osentowski T.D., Stinson L.J., Craford M.G., and Liao A.S.H. Appl. Phys. Lett. 61 (1992) 1045-1047
-
(1992)
Appl. Phys. Lett.
, vol.61
, pp. 1045-1047
-
-
Huang, K.H.1
Yu, J.G.2
Kuo, C.P.3
Fletcher, R.M.4
Osentowski, T.D.5
Stinson, L.J.6
Craford, M.G.7
Liao, A.S.H.8
-
66
-
-
0001170108
-
-
Ishiguro H., Sawa K., Nagao S., Yamanaka H., and Koike S. Appl. Phys. Lett. 43 (1983) 1034-1036
-
(1983)
Appl. Phys. Lett.
, vol.43
, pp. 1034-1036
-
-
Ishiguro, H.1
Sawa, K.2
Nagao, S.3
Yamanaka, H.4
Koike, S.5
-
67
-
-
0024738115
-
-
Ishikawa M., Okuda H., Itaya K., Shiozawa H., and Uematsu Y. Jpn. J. Appl Phys. 28 (1989) 1615-1621
-
(1989)
Jpn. J. Appl Phys.
, vol.28
, pp. 1615-1621
-
-
Ishikawa, M.1
Okuda, H.2
Itaya, K.3
Shiozawa, H.4
Uematsu, Y.5
-
68
-
-
0025800894
-
-
Ishikawa M., Shiozawa H., Itaya K., Hatakoshi G., and Uematsu Y. IEEE J. Quantum Electron. 27 (1991) 23-29
-
(1991)
IEEE J. Quantum Electron.
, vol.27
, pp. 23-29
-
-
Ishikawa, M.1
Shiozawa, H.2
Itaya, K.3
Hatakoshi, G.4
Uematsu, Y.5
-
69
-
-
0024142131
-
-
Itaya K., Ishikawa M., Watanabe Y., Nitta K., Hatakoshi G., and Uematsu Y. Jpn. J. Appl. Phys. 27 (1989) L2414-L2416
-
(1989)
Jpn. J. Appl. Phys.
, vol.27
-
-
Itaya, K.1
Ishikawa, M.2
Watanabe, Y.3
Nitta, K.4
Hatakoshi, G.5
Uematsu, Y.6
-
71
-
-
36549098737
-
-
Kaliski R.W., Epler J.E., Holonyak Jr. N., Peanasky M.J., Hermannsfeldt G.A., Drickamer H.G., Tsai M.J., Camras M.D., Kellert F.G., Wu C.H., and Craford M.G. J. Appl. Phys. 57 (1985) 1734-1738
-
(1985)
J. Appl. Phys.
, vol.57
, pp. 1734-1738
-
-
Kaliski, R.W.1
Epler, J.E.2
Holonyak Jr., N.3
Peanasky, M.J.4
Hermannsfeldt, G.A.5
Drickamer, H.G.6
Tsai, M.J.7
Camras, M.D.8
Kellert, F.G.9
Wu, C.H.10
Craford, M.G.11
-
72
-
-
0025720814
-
-
Kato T., Susawa H., Hirotani M., Saka T., Ohashi Y., Shichi E., and Shibata S. J. Cryst. Growth 107 (1991) 832-835
-
(1991)
J. Cryst. Growth
, vol.107
, pp. 832-835
-
-
Kato, T.1
Susawa, H.2
Hirotani, M.3
Saka, T.4
Ohashi, Y.5
Shichi, E.6
Shibata, S.7
-
75
-
-
0028423317
-
-
Kish F.A., Steranka F.M., Defevere D.C., Vanderwater D.A., Park K.G., Kuo C.P., Osentowski T.D., Peanasky M.J., Yu J.G., Fletcher R.M., Steigerwald D.A., Craford M.G., and Robbins V.M. Appl. Phys. Lett. 64 (1994) 2839-2841
-
(1994)
Appl. Phys. Lett.
, vol.64
, pp. 2839-2841
-
-
Kish, F.A.1
Steranka, F.M.2
Defevere, D.C.3
Vanderwater, D.A.4
Park, K.G.5
Kuo, C.P.6
Osentowski, T.D.7
Peanasky, M.J.8
Yu, J.G.9
Fletcher, R.M.10
Steigerwald, D.A.11
Craford, M.G.12
Robbins, V.M.13
-
76
-
-
0028530007
-
-
Kish F.A., Defevere D.C., Vanderwater D.A., Trott G.R., Weiss R.J., and Major Jr. J.S. Electron. Lett. 30 (1994) 1790-1791
-
(1994)
Electron. Lett.
, vol.30
, pp. 1790-1791
-
-
Kish, F.A.1
Defevere, D.C.2
Vanderwater, D.A.3
Trott, G.R.4
Weiss, R.J.5
Major Jr., J.S.6
-
77
-
-
77956773485
-
-
U.S. Pat.5,376,580
-
Kish, F.A., Steranka, F.M., DeFevere, D.C., Robbins, V.M. and Uebbing, J., (1994c). U.S. Pat.5,376,580
-
(1994)
-
-
Kish, F.A.1
Steranka, F.M.2
DeFevere, D.C.3
Robbins, V.M.4
Uebbing, J.5
-
78
-
-
21544484414
-
-
Kish F.A., Vanderwater D.A., Peanasky M.J., Ludowise M.J., Hummel S.G., and Rosner S.J. Appl. Phys. Lett. 67 (1995) 2060-2062
-
(1995)
Appl. Phys. Lett.
, vol.67
, pp. 2060-2062
-
-
Kish, F.A.1
Vanderwater, D.A.2
Peanasky, M.J.3
Ludowise, M.J.4
Hummel, S.G.5
Rosner, S.J.6
-
79
-
-
0029754371
-
-
Kish F.A., Vanderwater D.A., Defevere D.C., Steigerwald D.A., Holler G.E., Park K.G., and Steranka F.M. Electron. Lett. 32 (1996) 132-134
-
(1996)
Electron. Lett.
, vol.32
, pp. 132-134
-
-
Kish, F.A.1
Vanderwater, D.A.2
Defevere, D.C.3
Steigerwald, D.A.4
Holler, G.E.5
Park, K.G.6
Steranka, F.M.7
-
80
-
-
77956757032
-
-
U.S. Pat.5,502,316
-
Kish, F.A., Steranka, F.M., DeFevere, D.C., Robbins, V.M. and Uebbing, J., (1996b). U.S. Pat.5,502,316
-
(1996)
-
-
Kish, F.A.1
Steranka, F.M.2
DeFevere, D.C.3
Robbins, V.M.4
Uebbing, J.5
-
81
-
-
0022130657
-
-
Kobayashi K., Kawata S., Gomyo A., Hino I., and Suzuki T. Electron. Lett. 21 (1985) 931-932
-
(1985)
Electron. Lett.
, vol.21
, pp. 931-932
-
-
Kobayashi, K.1
Kawata, S.2
Gomyo, A.3
Hino, I.4
Suzuki, T.5
-
82
-
-
0000539948
-
-
Kobayashi T., Kojima H., Deol R.S., Buchan N., Heuberger W., Jakubowicz A., and Roentgen P. J. Phys. Chem. Solids 56 (1995) 311-317
-
(1995)
J. Phys. Chem. Solids
, vol.56
, pp. 311-317
-
-
Kobayashi, T.1
Kojima, H.2
Deol, R.S.3
Buchan, N.4
Heuberger, W.5
Jakubowicz, A.6
Roentgen, P.7
-
83
-
-
0028386336
-
-
Kondo M., Okada N., Domen K., Sugiura K., Anayama C., and Tanahashi T. J. Electron. Mater. 23 (1994) 355-358
-
(1994)
J. Electron. Mater.
, vol.23
, pp. 355-358
-
-
Kondo, M.1
Okada, N.2
Domen, K.3
Sugiura, K.4
Anayama, C.5
Tanahashi, T.6
-
85
-
-
0024104282
-
-
Kondow M., Kakibayashi H., Miagawa S., Inoue Y., Nishino T., and Hamakawa Y. J. Cryst. Growth 93 (1988) 412-417
-
(1988)
J. Cryst. Growth
, vol.93
, pp. 412-417
-
-
Kondow, M.1
Kakibayashi, H.2
Miagawa, S.3
Inoue, Y.4
Nishino, T.5
Hamakawa, Y.6
-
88
-
-
0024103876
-
-
Kuo C.P., Fletcher R.M., Osentowski T.D., Craford M.G., Nam D.W., Holonyak Jr. N., Hsieh K.C., and Fouquet J.E. J. Cryst. Growth 93 (1988) 389-395
-
(1988)
J. Cryst. Growth
, vol.93
, pp. 389-395
-
-
Kuo, C.P.1
Fletcher, R.M.2
Osentowski, T.D.3
Craford, M.G.4
Nam, D.W.5
Holonyak Jr., N.6
Hsieh, K.C.7
Fouquet, J.E.8
-
89
-
-
0001218567
-
-
Kuo C.P., Fletcher R.M., Osentowski T.D., Lardizabal M.C., Craford M.G., and Robbins V.M. Appl. Phys. Lett. 57 (1990) 2937-2939
-
(1990)
Appl. Phys. Lett.
, vol.57
, pp. 2937-2939
-
-
Kuo, C.P.1
Fletcher, R.M.2
Osentowski, T.D.3
Lardizabal, M.C.4
Craford, M.G.5
Robbins, V.M.6
-
90
-
-
77956789745
-
-
U.S. Pat. 5,060,028
-
Kuo, C.P., Fletcher, R.M. and Osentowski, T.D., (1991). U.S. Pat. 5,060,028
-
(1991)
-
-
Kuo, C.P.1
Fletcher, R.M.2
Osentowski, T.D.3
-
91
-
-
77956787728
-
-
Hunt C.E., Baumgart H., Iyer S.S., Abe T., and Gosele U. (Eds), lectrochemical Society, Reno, NV
-
Laporte A., Benamara M., Sarrabayrouse G., Rocher A., Lescouzeres L., Peyrelavigne A., and Gaverie A. In: Hunt C.E., Baumgart H., Iyer S.S., Abe T., and Gosele U. (Eds). "Third International Symposium on Semiconductor Wafer Bonding: Physics and Applications" 95-7 (1994), lectrochemical Society, Reno, NV
-
(1994)
"Third International Symposium on Semiconductor Wafer Bonding: Physics and Applications"
, vol.95-7
-
-
Laporte, A.1
Benamara, M.2
Sarrabayrouse, G.3
Rocher, A.4
Lescouzeres, L.5
Peyrelavigne, A.6
Gaverie, A.7
-
96
-
-
3643053193
-
-
Lin J.-F., Wu M.-C., Jou M.-J., Chang C.-M., Chen C.-Y., and Lee B.-J. J. Appl. Phys. 74 (1993) 1781-1786
-
(1993)
J. Appl. Phys.
, vol.74
, pp. 1781-1786
-
-
Lin, J.-F.1
Wu, M.-C.2
Jou, M.-J.3
Chang, C.-M.4
Chen, C.-Y.5
Lee, B.-J.6
-
97
-
-
0027632509
-
-
Lin J.-F., Wu M.-C., Jou M.-J., Chang C.-M., and Lee B.-J. Electron. Lett. 29 (1993) 1346-1347
-
(1993)
Electron. Lett.
, vol.29
, pp. 1346-1347
-
-
Lin, J.-F.1
Wu, M.-C.2
Jou, M.-J.3
Chang, C.-M.4
Lee, B.-J.5
-
98
-
-
0028532479
-
-
Lin J.-F., Wu M.-C., Jou M.-J., Chang C.-M., Lee B.-J., and Tsai Y.-T. Electron. Lett. 30 (1994) 1793-1794
-
(1994)
Electron. Lett.
, vol.30
, pp. 1793-1794
-
-
Lin, J.-F.1
Wu, M.-C.2
Jou, M.-J.3
Chang, C.-M.4
Lee, B.-J.5
Tsai, Y.-T.6
-
99
-
-
0029250048
-
-
Lin J.-F., Wu M.-C., Jou M.-J., Chang C.-M., and Lee B.-J. Solid-State Electron. 38 (1995) 305-308
-
(1995)
Solid-State Electron.
, vol.38
, pp. 305-308
-
-
Lin, J.-F.1
Wu, M.-C.2
Jou, M.-J.3
Chang, C.-M.4
Lee, B.-J.5
-
100
-
-
84975363590
-
-
Lin J.-F., Wu M.-C., Jou M.-J., Chang C.-M., and Lee B.-J. J. Electrochem. Soc. 142 (1995) 1293-1297
-
(1995)
J. Electrochem. Soc.
, vol.142
, pp. 1293-1297
-
-
Lin, J.-F.1
Wu, M.-C.2
Jou, M.-J.3
Chang, C.-M.4
Lee, B.-J.5
-
101
-
-
21544450368
-
-
Lo Y.H., Bhat R., Hwang D.M., Koza M.A., and Lee T.P. Appl. Phys. Lett. 58 (1991) 1961-1963
-
(1991)
Appl. Phys. Lett.
, vol.58
, pp. 1961-1963
-
-
Lo, Y.H.1
Bhat, R.2
Hwang, D.M.3
Koza, M.A.4
Lee, T.P.5
-
102
-
-
0027911766
-
-
Lo Y.H., Bhat R., Hwang D.M., Chua C., and Lin C.-H. Appl. Phys. Lett. 62 (1993) 1038-1040
-
(1993)
Appl. Phys. Lett.
, vol.62
, pp. 1038-1040
-
-
Lo, Y.H.1
Bhat, R.2
Hwang, D.M.3
Chua, C.4
Lin, C.-H.5
-
104
-
-
11344261714
-
-
Macksey H.M., Holonyak Jr. N., Scifres D.R., Dupuis R.D., and Zack G.W. Appl. Phys. Lett. 19 (1971) 271-273
-
(1971)
Appl. Phys. Lett.
, vol.19
, pp. 271-273
-
-
Macksey, H.M.1
Holonyak Jr., N.2
Scifres, D.R.3
Dupuis, R.D.4
Zack, G.W.5
-
105
-
-
0015679520
-
-
Macksey H.M., Lee M.H., Holonyak Jr. N., Hitchens W.R., Dupuis R.D., and Campbell J.C. J. Appl. Phys. 44 (1973) 5035-5040
-
(1973)
J. Appl. Phys.
, vol.44
, pp. 5035-5040
-
-
Macksey, H.M.1
Lee, M.H.2
Holonyak Jr., N.3
Hitchens, W.R.4
Dupuis, R.D.5
Campbell, J.C.6
-
109
-
-
0029324506
-
-
Meney A.T., Prins A.D., Phillips A.F., Sly J.L., O'Reilly E.P., Dunstan D.J., Adams A.R., and Valster A. IEEE J. Sel. Top. Quantum Electron. 1 (1995) 697-706
-
(1995)
IEEE J. Sel. Top. Quantum Electron.
, vol.1
, pp. 697-706
-
-
Meney, A.T.1
Prins, A.D.2
Phillips, A.F.3
Sly, J.L.4
O'Reilly, E.P.5
Dunstan, D.J.6
Adams, A.R.7
Valster, A.8
-
112
-
-
0000895629
-
-
Mowbray D.J., Kowalski O.P., Hopkinson M., Skolnick M.S., and David J.P.R. Appl. Phys. Lett. 65 (1994) 213-215
-
(1994)
Appl. Phys. Lett.
, vol.65
, pp. 213-215
-
-
Mowbray, D.J.1
Kowalski, O.P.2
Hopkinson, M.3
Skolnick, M.S.4
David, J.P.R.5
-
113
-
-
0029389357
-
-
Nakamura S., Senoh M., Iwasa N., Nagahama S., Yamada T., and Mukai T. Jpn. J. Appl. Phys. 34 (1995) L1332-L1335
-
(1995)
Jpn. J. Appl. Phys.
, vol.34
-
-
Nakamura, S.1
Senoh, M.2
Iwasa, N.3
Nagahama, S.4
Yamada, T.5
Mukai, T.6
-
114
-
-
0026220495
-
-
Naritsuka S., Nishikawa Y., Sugawara H., Ishikawa M., and Kokubun Y. J. Electron. Mater. 20 (1991) 687-690
-
(1991)
J. Electron. Mater.
, vol.20
, pp. 687-690
-
-
Naritsuka, S.1
Nishikawa, Y.2
Sugawara, H.3
Ishikawa, M.4
Kokubun, Y.5
-
119
-
-
0026867368
-
-
Nitta K., Okajima M., Nishikawa Y., Itaya K., and Hatakoshi G. Electron. Lett. 28 (1992) 1069-1070
-
(1992)
Electron. Lett.
, vol.28
, pp. 1069-1070
-
-
Nitta, K.1
Okajima, M.2
Nishikawa, Y.3
Itaya, K.4
Hatakoshi, G.5
-
122
-
-
0024104398
-
-
Nozaki C., Ohba Y., Sugawara H., Yasuami S., and Nakanisi T. J. Crys. Growth 93 (1988) 406-411
-
(1988)
J. Crys. Growth
, vol.93
, pp. 406-411
-
-
Nozaki, C.1
Ohba, Y.2
Sugawara, H.3
Yasuami, S.4
Nakanisi, T.5
-
126
-
-
0000784328
-
-
Ohba Y., Ishikawa M., Sugawara H., Yamamoto M., and Nakanisi T. J. Cryst. Growth 77 (1986) 374-379
-
(1986)
J. Cryst. Growth
, vol.77
, pp. 374-379
-
-
Ohba, Y.1
Ishikawa, M.2
Sugawara, H.3
Yamamoto, M.4
Nakanisi, T.5
-
127
-
-
0024681326
-
-
Okuda H., Ishikawa M., Shiozawa H., Watanabe Y., Itaya K., Nitta K., Hatakoshi G., Kokubun Y., and Uematsu Y. IEEE J. Quantum Electron. 25 (1989) 1477-1482
-
(1989)
IEEE J. Quantum Electron.
, vol.25
, pp. 1477-1482
-
-
Okuda, H.1
Ishikawa, M.2
Shiozawa, H.3
Watanabe, Y.4
Itaya, K.5
Nitta, K.6
Hatakoshi, G.7
Kokubun, Y.8
Uematsu, Y.9
-
128
-
-
36449006172
-
-
Okuno Y., Uomi K., Aoki M., Taniwatari T., Suzuki M., and Kondow M. Appl. Phys. Lett. 66 (1995) 451-453
-
(1995)
Appl. Phys. Lett.
, vol.66
, pp. 451-453
-
-
Okuno, Y.1
Uomi, K.2
Aoki, M.3
Taniwatari, T.4
Suzuki, M.5
Kondow, M.6
-
131
-
-
0000077821
-
-
Prins A.D., Sly J.L., Meney A.T., Dunstan D.J., O'Reilly E.P., Adams A.R., and Valster A. J. Phys. Chem. Solids 56 (1995) 349-352
-
(1995)
J. Phys. Chem. Solids
, vol.56
, pp. 349-352
-
-
Prins, A.D.1
Sly, J.L.2
Meney, A.T.3
Dunstan, D.J.4
O'Reilly, E.P.5
Adams, A.R.6
Valster, A.7
-
132
-
-
3643101878
-
-
Prins A.D., Sly J.L., Meney A.T., Dunstan D.J., O'Reilly E.P., Adams A.R., and Valster A. J. Phys. Chem. Solids 56 (1995) 423-427
-
(1995)
J. Phys. Chem. Solids
, vol.56
, pp. 423-427
-
-
Prins, A.D.1
Sly, J.L.2
Meney, A.T.3
Dunstan, D.J.4
O'Reilly, E.P.5
Adams, A.R.6
Valster, A.7
-
134
-
-
36449007697
-
-
Richard T.A., Holonyak Jr. N., Kish F.A., Keever M.R., and Lei C. Appl. Phys. Lett. 66 (1995) 2972-2974
-
(1995)
Appl. Phys. Lett.
, vol.66
, pp. 2972-2974
-
-
Richard, T.A.1
Holonyak Jr., N.2
Kish, F.A.3
Keever, M.R.4
Lei, C.5
-
140
-
-
21544432857
-
-
Stinson L.J., Yu J.G., Lester S.D., Peanasky M.J., and Park K. Appl. Phys. Lett. 58 (1991) 2012-2014
-
(1991)
Appl. Phys. Lett.
, vol.58
, pp. 2012-2014
-
-
Stinson, L.J.1
Yu, J.G.2
Lester, S.D.3
Peanasky, M.J.4
Park, K.5
-
142
-
-
77956743593
-
-
U.S. Pat. 5,048,035
-
Sugawara, H., Ishikawa, M., Kokubun, Y., Nishikawa, Y. and Naritsuka, S., (1991b). U.S. Pat. 5,048,035
-
(1991)
-
-
Sugawara, H.1
Ishikawa, M.2
Kokubun, Y.3
Nishikawa, Y.4
Naritsuka, S.5
-
145
-
-
77956771126
-
-
U.S. Pat.5,153,889
-
Sugawara, H., Ishikawa, M., Kokubun, Y., Nishikawa, Y., Naritsuka, S., Itaya, K., Hatakoshi, G. and Suzuki, M., (1992c). U.S. Pat.5,153,889
-
(1992)
-
-
Sugawara, H.1
Ishikawa, M.2
Kokubun, Y.3
Nishikawa, Y.4
Naritsuka, S.5
Itaya, K.6
Hatakoshi, G.7
Suzuki, M.8
-
149
-
-
0000177550
-
-
Sugiura K., Domen K., Sugawara M., Anayama C., Kondo M., Tanahashi T., and Nakajima K. J. Appl. Phys. 70 (1991) 4946-4949
-
(1991)
J. Appl. Phys.
, vol.70
, pp. 4946-4949
-
-
Sugiura, K.1
Domen, K.2
Sugawara, M.3
Anayama, C.4
Kondo, M.5
Tanahashi, T.6
Nakajima, K.7
-
150
-
-
0026414870
-
-
Suzuki M., Ishikawa M., Itaya K., Nishikawa Y., Hatakoshi G., and Kokubun Y. J. Cryst. Growth 115 (1991) 498-503
-
(1991)
J. Cryst. Growth
, vol.115
, pp. 498-503
-
-
Suzuki, M.1
Ishikawa, M.2
Itaya, K.3
Nishikawa, Y.4
Hatakoshi, G.5
Kokubun, Y.6
-
151
-
-
0027906533
-
-
Suzuki M., Itaya K., Nishikawa Y., Sugawara H., and Okajima M. J. Cryst. Growth 133 (1993) 303-308
-
(1993)
J. Cryst. Growth
, vol.133
, pp. 303-308
-
-
Suzuki, M.1
Itaya, K.2
Nishikawa, Y.3
Sugawara, H.4
Okajima, M.5
-
153
-
-
0024106613
-
-
Suzuki T., Gomyo A., Lijima S., Kobayashi K., Kawata S., Hino I., and Yuasa T. Jpn. J. Appl. Phys. 27 (1988) 2098-2106
-
(1988)
Jpn. J. Appl. Phys.
, vol.27
, pp. 2098-2106
-
-
Suzuki, T.1
Gomyo, A.2
Lijima, S.3
Kobayashi, K.4
Kawata, S.5
Hino, I.6
Yuasa, T.7
-
155
-
-
0028463352
-
-
Tan I.-H., Dudley J.J., Babic D.I., Cohen D.A., Young B.D., Hu E.L., Bowers J.E., Miller B.I., Koren U., and Young M.G. IEEE Photon. Technol. Lett. 6 (1994) 811-813
-
(1994)
IEEE Photon. Technol. Lett.
, vol.6
, pp. 811-813
-
-
Tan, I.-H.1
Dudley, J.J.2
Babic, D.I.3
Cohen, D.A.4
Young, B.D.5
Hu, E.L.6
Bowers, J.E.7
Miller, B.I.8
Koren, U.9
Young, M.G.10
-
158
-
-
0000403155
-
-
Tanaka H., Kawamura Y., Nojima S., Wakita K., and Asahi H. J. Appl. Phys. 61 (1987) 1713-1719
-
(1987)
J. Appl. Phys.
, vol.61
, pp. 1713-1719
-
-
Tanaka, H.1
Kawamura, Y.2
Nojima, S.3
Wakita, K.4
Asahi, H.5
-
166
-
-
36549092991
-
-
Yablonovitch E., Hwang D.M., Gmitter T.J., Florez L.T., and Harbison J.P. Appl. Phys. Lett. 56 (1990) 2419-2421
-
(1990)
Appl. Phys. Lett.
, vol.56
, pp. 2419-2421
-
-
Yablonovitch, E.1
Hwang, D.M.2
Gmitter, T.J.3
Florez, L.T.4
Harbison, J.P.5
|