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Volumn , Issue , 2006, Pages 573-576

Dependence of DGMOSFET 1/f noise on transistor geometry and technology parameters

Author keywords

[No Author keywords available]

Indexed keywords

1/F NOISE; AC CURRENTS; CURRENT NOISE; DG MOSFETS; LOAD RESISTANCES; MOS TRANSISTORS; MOS-FET; NOISE SOURCE; OXIDE THICKNESS; SENSITIVITY TO VARIATIONS; SMALL SIGNAL; SOURCE/DRAIN JUNCTIONS; TECHNOLOGY PARAMETERS; THEORETICAL STUDY;

EID: 77956543346     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICMEL.2006.1651021     Document Type: Conference Paper
Times cited : (2)

References (14)
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    • Barsan, R.M.1
  • 2
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    • (1982) IEEE Trans.Electron Dev. , vol.ED-29 , Issue.10 , pp. 1516-1521
    • Barsan, R.M.1
  • 3
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    • A general theory of phase noise in electrical theory
    • Feb.
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    • (1998) IEEE J.Solid-St.Circ. , vol.33 , Issue.2 , pp. 179-194
    • Hajimiri, A.1    Lee, T.H.2
  • 8
    • 33845884524 scopus 로고    scopus 로고
    • Numerical analysis of DGMOSFET 1/f noise under different bias conditions
    • Belgrade, November
    • M.Videnović-Mišić and M.Jevtić , " Numerical Analysis of DGMOSFET 1/f Noise Under Different Bias Conditions" , Proc. IEEE EUROCON 2005, pp. 1232-1235, Belgrade, November 2005.
    • (2005) Proc. IEEE EUROCON 2005 , pp. 1232-1235
    • Videnović-Mišić, M.1    Jevtić, M.2
  • 9
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    • 1/f Noise in CMOS transistors for analog applications from subtreshold to saturation
    • C.Jakobson, I. Bloom, Y. Nemirovsky, " 1/f Noise in CMOS transistors for analog applications from subtreshold to saturation" , Solid-St. Electronics, vol.42, No.10, pp. 1807-1817, 1998.
    • (1998) Solid-St. Electronics , vol.42 , Issue.10 , pp. 1807-1817
    • Jakobson, C.1    Bloom, I.2    Nemirovsky, Y.3
  • 12
    • 0024732795 scopus 로고
    • A 1/f noise technique to extract the oxide trap density near the conduction band edge of silicon
    • Raj Jayaraman, Charles G. Sodini, " A 1/f noise Technique to Extract the Oxide Trap Density Near the Conduction Band Edge of Silicon" , IEEE Trans. Electr. Dev., vol.36, No.9, 1989.
    • (1989) IEEE Trans. Electr. Dev. , vol.36 , Issue.9
    • Jayaraman, R.1    Sodini, C.G.2
  • 13
    • 0034227615 scopus 로고    scopus 로고
    • Use of transient enhanced diffusion to tailor boron out-diffusion
    • Hong-Ha Vuong at all, " Use of Transient Enhanced Diffusion to Tailor Boron Out-Diffusion" , IEEE Trans. Electr. Dev., vol.47, No 7, pp. 1401-11205, 2000.
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  • 14
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    • Saki, K.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.