Vacuum breakdown limit and quantum efficiency obtained for various technical metals using dc and pulsed voltage sources

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 28, Issue 5, 2010, Pages 1191-1202

  Le Pimpec, F ^a   Gough, C ^a   Paraliev, M ^a   Ganter, R ^a   Hauri, C ^a   Ivkovic, S ^a  

^a PAUL SCHERRER INSTITUTE   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

BREAKDOWN TESTS; ELECTRON BEAM OPERATIONS; EMITTANCE DILUTION; GLOW PLASMAS; HIGH GRADIENT; LOW EMITTANCE; METAL ELECTRODES; PREPARATION METHOD; PULSED-VOLTAGE SOURCES; RELIABLE OPERATION; REPETITION RATE; SECOND PHASE; SPACE CHARGE EFFECTS; STABILITY TESTS; ULTRAVIOLET LASER; VACUUM BREAKDOWN;

ARGON; ELECTRIC FIELDS; ELECTRODES; ELECTRON BEAMS; ELECTRON GUNS; LASER BEAM EFFECTS; METALS; TEST FACILITIES; ULTRAVIOLET LASERS;

QUANTUM EFFICIENCY;

EID: 77956418710     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3478300     Document Type: Article

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