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Volumn 21, Issue 4, 2003, Pages 1230-1239
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Enhanced field emission from chemically etched and electropolished broad-area niobium
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTROLYTIC POLISHING;
ELECTRON EMISSION;
ENERGY DISPERSIVE SPECTROSCOPY;
ETCHING;
MACHINING;
METAL CLEANING;
PARTICLES (PARTICULATE MATTER);
SCANNING ELECTRON MICROSCOPY;
ENHANCED FIELD EMISSION (EFE);
NIOBIUM;
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EID: 0141569937
PISSN: 10711023
EISSN: None
Source Type: Journal
DOI: 10.1116/1.1574047 Document Type: Conference Paper |
Times cited : (10)
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References (21)
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