Microstructural evolution of sol-gel derived ZnO thin films

Thin Solid Films

Volumn 518, Issue 23, 2010, Pages 6792-6798

  Miller, James B ^a,b   Hsieh, Hsin Jung ^a   Howard, Bret H ^b   Broitman, Esteban ^a  

^a CARNEGIE MELLON UNIVERSITY   (United States)

^b NATIONAL ENERGY TECHNOLOGY LABORATORY   (United States)

Author keywords

Annealing; Scanning electron microscopy; Sol gel; Surface morphology; Thin films; X ray diffraction; Zinc oxide

Indexed keywords

ACETATE GROUPS; C-AXIS DIRECTION; C-AXIS ORIENTATIONS; GLASS SUBSTRATES; HIGHER TEMPERATURES; INTERCALATED WATER; ISO-PROPANOLS; MECHANICAL STRESS; MICRON SCALE; MONOETHANOLAMINE; NANO GRAINS; ORDERING PROCESS; PRECURSOR CONCENTRATION; SCANNING ELECTRONS; SOL-GEL PRECURSORS; WURTZITE STRUCTURE; ZINC ACETATE; ZINC ACETATE DIHYDRATE; ZINC OXIDE THIN FILMS; ZNO; ZNO THIN FILM;

CALCINATION; DIFFRACTION; GELS; HEAT TREATMENT; SCANNING ELECTRON MICROSCOPY; SOL-GEL PROCESS; SOL-GELS; SOLS; SPIN GLASS; STRESSES; SUBSTRATES; SURFACE MORPHOLOGY; THIN FILMS; TOPOGRAPHY; VAPOR DEPOSITION; X RAY DIFFRACTION; ZINC; ZINC COATINGS; ZINC OXIDE; ZINC SULFIDE;

OXIDE FILMS;

EID: 77956227795     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.06.032     Document Type: Article

References (50)

1. Q. Cui, K. Yu, N. Zhang, and Z. Zhu Appl. Surf. Sci. 254 2008 3517
2. C. Klingshirn Chem. Phys. Chem. 8 2007 782
3. T.-J. Hsueh, Y.-.W. Chen, S.J. Chang, S.-F. Wang, C.L. Hsu, Y.-R. Lin, T.-S. Lin, and I.-C. Chen Sens. Actuators B 125 2007 498
4. P. Bera, and J.M. Vohs J. Phys. Chem. C. 111 2007 7049
5. S. Kar, B.N. Pal, S. Chaudhuri, and D. Chakravorty J. Phys. Chem. B 110 2006 4605
6. P. Battacharyya, P.K. Basu, H. Saha, and S. Basu Sens. Actuators B 124 2007 62
7. K.-W. Kim, P.S. Cho, S.-J. Kim, J.-H. Lee, C.-Y. Kang, J.-S. Kim, and S.-J. Yoon Sens. Actuators B 123 2007 318
8. A.M.P. Santos, and E.J.P. Santos Thin Solid Films 516 2008 6210
9. S. Si, C. Li, X. Wang, Q. Peng, and Y. Li Sens. Actuators B 119 2006 52
10. R.E. Marotti, C.D. Bojorge, E. Broitman, H.R. Canepa, J.A. Badan, E.A. Dalchiele, and A.J. Gellman Thin Solid Films 517 2008 1077
11. E. Hosono, S. Fujihara, T. Kimura, and I. Hiroaki J. Coll. Interface Sci. 272 2004 391
12. E. Hosono, F. Shinobu, and T. Kimura J. Mater. Chem. 14 2004 881
13. Y.-S. Kim, W.-P. Tai, and S.-J. Shu Thin Solid Films 491 2005 153
14. J.-H. Lee, K.-H. Ko, and B.O. Park J. Cryst. Growth 247 2003 119
15. J.-H. Lee, B.-W. Yeo, and B.O. Park Thin Solid Films 457 2004 333
16. M. Ohyama, H. Kozuka, and T. Yoko Thin Solid Films 306 1997 78
17. M.W. Zhu, J.H. Xia, R.J. Hong, H. Abu-Samra, H. Huang, T. Staedler, J. Gong, C. Sun, and X. Jiang J. Cryst. Growth 310 2008 816
18. S. Choopun, N. Hongsith, P. Mangkorntong, and N. Mangkorntong Physica E 39 2007 53
19. H. Gong, J.Q. Hu, J.H. Wang, C.H. Ong, and F.R. Zhu Sens. Actuators B 115 2006 247
20. X.D. Wang, C.J. Summers, and Z.L. Wang Nanolett. 4 2004 423
21. L. Liao, H.B. Lu, J.C. Li, H. He, D.F. Wang, D.J. Fu, C. Liu, and W.F. Zhang J. Phys. Chem. C. 111 2007 1900
22. X.D. Wang, J. Zhou, J.H. Song, J. Liu, N. Xu, and Z.L. Wang Nanolett. 6 2006 2768
23. D.F. Liu, Y.J. Xiang, X.C. Wu, Z.X. Zhang, L.F. Liu, L. Song, X.W. Zhao, S.D. Luo, W.J. Ma, J. Shen, W.Y. Zhou, G. Wang, C.Y. Wang, and S.S. Xie Nanolett. 6 2006 2375
24. P. Gao, and Z.L. Wang J. Phys. Chem. B 106 2002 12653
25. X.B. Wang, C. Song, K.W. Geng, F. Zeng, and F. Pan Appl. Surf. Sci. 253 2007 6905
26. S.H. Lee, H.J. Lee, D. Oh, S.W. Lee, H. Goto, R. Buckmaster, T. Yasukawa, T. Matsue, S.K. Hong, H.C. Ko, M.W. Cho, and T. Yao J. Phys. Chem. B 110 2006 3856
27. J.H. He, J.H. Hsu, C.W. Wang, H.N. Lin, L.J. Chen, and Z.L. Wang J. Phys. Chem. B 110 2006 50
28. L.M. Li, C.C. Li, J. Zhang, Z.F. Du, B.S. Zou, H.C. Yu, Y.G. Wang, and T.H. Wang Nanotech. 18 2007 1
29. B.A. Buchine, W.L. Hughes, F.L. Degertekin, and Z.L. Wang Nanolett. 6 2006 1155
30. J.H. He, C.S. Lao, L.J. Chen, D. Davidovic, and Z.L. Wang J. Amer. Chem. Soc 127 2005 16376
31. Y. Tak, and K. Yong J. Phys. Chem. B 109 2005 19263
32. Y. Tak, K. Yong, and C. Park J. Electrochem. Soc. 152 2005 19263
33. Y. Tak, K. Yong, and Y. Ryu Nanotechnology 16 2005 1217
34. Y. Tak, K. Yong, and C. Park J. Vac. Sci. Technol. B 24 2006 2047
35. X. Zhou, T. Yiang, J. Zhang, X. Wang, and Z. Zhu Sens. Actuators B 123 2007 299
36. V.R. Shinde, T.P. Gugar, C.D. Lohandke, R.S. Mane, and S.-H. Han Mater. Sci. Eng. B 137 2007 119
37. N.R.S. Farley, C.R. Staddon, L. Zhao, K.W. Edmonds, B.L. Gallagher, and D.H. Gregory J. Mater. Chem. 14 2004 1087
38. J.B. Miller, and E.I. Ko Catalysis Today 35 1997 269
39. D. Bao, H. Gu, and A. Kuang Thin Solid Films 312 1998 37
40. E. Hosono, S. Fujihara, T. Kimura, and H. Imai J. Sol-Gel Sci. Tech. 29 2004 71
41. L. Poul, N. Jouini, and F. Fievet Chem. Mater. 12 2000 3123
42. T. Biswick, W. Jones, A. Pacula, E. Serwicka, and J. Podobinski Solid State Sci. 11 2009 330
43. J. Lee, A.J. Easteal, U. Pal, and D. Battacharyya Curr. Appl. Phys. 9 2009 792
44. J. Wang, Y. Qi, Z. Zhi, J. Guo, M. Li, and Y. Zhang Smart Mater. Struct. 16 2007 2673
45. S.J. Kwon, J.-H. Park, and J.-G. Park Phys. Rev. E 71 2005 011604
46. J.C. Lee, M.H. Hon, and I.C. Leu Scr. Mater. 62 2010 529
47. Y.-W. Jun, J.-S. Choi, and J. Cheon Angew. Chem. Intl. Ed 45 2006 3414
48. S.-M. Lee, Y.-W. Jun, S.-N. Cho, and J. Cheon J. Am. Ceram. Soc. 124 2002
49. S.K. Basu, A.M. Bergstresser, L.F. Francis, L.E. Scriven, and A.V. McCormick J. Appl. Phys. 98 2005 063507
50. M. Takahashi, T. Maeda, K. Uemura, J. Uao, Y. Tokuda, T. Yoko, H. Kaji, A. Marcelli, and P. Innocenzi Adv. Mater. 19 2007 4343