Deposition of the ZnO transparent electrodes at atmospheric pressure using a DC Arc Plasmatron

Thin Solid Films

Volumn 518, Issue 22, 2010, Pages 6160-6162

  Penkov, Oleksiy V ^a   Lee, Heon Ju ^a   Plaksin, Vadim Y ^a   Mansur, Rakib ^a   Kim, Ji Hun ^a  

^a Jeju National University   (South Korea)

Author keywords

Annealing; Hydrogenation; Plasmatron; ZnO

Indexed keywords

AMORPHOUS STRUCTURES; ARGON PLASMAS; AS-DEPOSITED STATE; COLD SUBSTRATES; CRYSTALLINE STRUCTURE; ELECTRICAL PROPERTY; HYDROGEN ATMOSPHERE; PLASMA TREATMENT; PLASMATRONS; TRANSPARENT ELECTRODE; ZNO; ZNO FILMS;

ANNEALING; ARGON; ATMOSPHERIC PRESSURE; ELECTRIC PROPERTIES; HYDROGEN; HYDROGENATION; METALLIC FILMS; PLASMA APPLICATIONS; SURFACE TREATMENT; ZINC OXIDE;

AMORPHOUS FILMS;

EID: 77956059662     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.02.072     Document Type: Conference Paper

References (6)

1. J. Lee, D. Lee, D. Lim, and K. Yang Thin Solid Films 515 2007 6094
2. K. Haga, F. Katahira, and H. Watanabe Thin Solid Films 145 1999 343
3. K. Haga, P.S. Wijesena, and H. Watanabe Appl. Surf. Sci. 504 2001 169
4. V.Yu. Plaksin, S.B. Joa, H.J. Lee, and C.K. Choi J. Kor. Phys. Soc. 50 2007 723
5. O.V. Penkov, H.J. Lee, V.Yu. Plaksin, S.B. Joa, C.J. Yim, and M.G. Ko Rev. Sci. Instrum. 79 2008 02C504
6. K. Ellmer, A. Klein, and B. Rech Transparent Conductive Zinc Oxide 2008 Springer-Verlag Berlin