Effect of ion beam irradiation on the structure of ZnO films deposited by a dc arc plasmatron

Review of Scientific Instruments

Volumn 79, Issue 2, 2008, Pages

  Penkov, Oleksiy V ^a   Lee, Heon Ju ^a   Plaksin, Vadim Yu ^a   Ko, Min Gook ^a   Joa, Sang Beom ^a   Yim, Chan Joo ^a  

^a Jeju National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

COLD CATHODE TUBES; DEPOSITION; ION BEAMS; ION BOMBARDMENT; POLYCRYSTALLINE MATERIALS; ZINC OXIDE;

DEPOSITION RATE; ION BEAM ENERGY; LOW ENERGY OXYGEN ION BEAM; PLASMATRONS;

THIN FILMS;

EID: 40149098980     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2804627     Document Type: Article

References (4)

1. J. Lee, D. Lee, D. Lim, and K. Yang, Thin Solid Films THSFAP 0040-6090 515, 6094 (2007).
2. K. Haga, F. Katahira, and H. Watanabe, Thin Solid Films THSFAP 0040-6090 145, 343 (1999).
3. K. Haga, P. S. Wijesena, and H. Watanabe, Appl. Surf. Sci. ASUSEE 0169-4332 504, 169 (2001).
4. G. E. Bugrov, S. K. Kondranin, E. A. Kralkina, V. B. Pavlov, D. V. Savinov, K. V. Vavilin, and H. J. Lee, Curr. Appl. Phys. ZZZZZZ 1567-1739 3, 485 (2003).