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Volumn 50, Issue 3, 2007, Pages 723-727

Etching of silicon substrates by using a plasmatron

Author keywords

[No Author keywords available]

Indexed keywords


EID: 34147119557     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.50.723     Document Type: Article
Times cited : (4)

References (9)
  • 1
    • 34147133396 scopus 로고    scopus 로고
    • D. G. Bykhovsky and A. Ya. Medvedev, Soviet Inventor's Certificate 287214 1968
    • D. G. Bykhovsky and A. Ya. Medvedev, Soviet Inventor's Certificate 287214 (1968).
  • 2
    • 34147137897 scopus 로고    scopus 로고
    • Matsushita Electric Works Machine & Vision Ltd. [URL: http://www.mewmv.co.Jp/aiplasma/k/index.htm].
    • Matsushita Electric Works Machine & Vision Ltd. [URL: http://www.mewmv.co.Jp/aiplasma/k/index.htm].


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.