Fabrication of ZnO thin films by femtosecond pulsed laser deposition

Optics and Laser Technology

Volumn 42, Issue 8, 2010, Pages 1337-1339

  Chau, Joseph Lik Hang ^a   Yang, Min Chieh ^a   Nakamura, Takahiro ^b   Sato, Shunichi ^b   Yang, Chih Chao ^a   Cheng, Chung Wei ^a  

^a INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^b TOHOKU UNIVERSITY   (Japan)

Author keywords

Femtosecond; Thin films; Zinc oxide

Indexed keywords

CRYSTAL QUALITIES; DEPOSITION TIME; FEMTOSECOND; FEMTOSECOND PULSED-LASER DEPOSITION; FEMTOSECONDS; OXYGEN PRESSURE; PLD PROCESS; PLD TECHNIQUE; PULSED LASER; SAPPHIRE SUBSTRATES; SUBSTRATE TEMPERATURE; VACUUM CONDITION; ZNO FILMS; ZNO THIN FILM;

CHEMICAL VAPOR DEPOSITION; DEPOSITION; METALLIC FILMS; OPTICAL FILMS; OXYGEN; PRESSURE EFFECTS; PULSED LASER DEPOSITION; PULSED LASERS; SAPPHIRE; SUBSTRATES; THIN FILMS; ZINC; ZINC OXIDE;

OXIDE FILMS;

EID: 77955690192     PISSN: 00303992     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optlastec.2010.04.015     Document Type: Article

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