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Thin Solid Films

Volumn 518, Issue 16, 2010, Pages 4615-4618

On the structural and electrical characteristics of zinc oxide thin films

(5) Prepelita, Petronela a Medianu, R a Garoi, F a Stefan, N a Iacomi, Felicia b

a NATIONAL INSTITUTE FOR LASER (Romania)

b ALEXANDRU IOAN CUZA UNIVERSITY OF IASI (Romania)

Author keywords

Electrical properties; Rf magnetron sputtering; Thin films; Zinc oxide

Indexed keywords

COOLING PROCESS; ELECTRICAL CHARACTERISTIC; ELECTRICAL CONDUCTION; ELECTRICAL PROPERTY; ELECTRICAL STUDIES; GLASS SUBSTRATES; OXIDATION CONDITIONS; POLYCRYSTALLINE; POLYCRYSTALLINE STRUCTURE; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; STRUCTURAL AND ELECTRICAL PROPERTIES; SUBSTRATE SURFACE; THERMAL ACTIVATION ENERGIES; VAN DER PAUW METHOD; WURTZITES; ZINC OXIDE THIN FILMS; ZNO; ZNO FILMS; ZNO LAYERS; ZNO THIN FILM;

ACTIVATION ENERGY; MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL FILMS; OXIDE FILMS; STRUCTURAL PROPERTIES; SUBSTRATES; SURFACE ROUGHNESS; THIN FILMS; VAPOR DEPOSITION; ZINC; ZINC OXIDE; ZINC SULFIDE;

ELECTRIC PROPERTIES;

EID: 77955644260 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2009.12.044 Document Type: Conference Paper

Times cited : (12)

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