Investigation of BST thin films deposited by RF magnetron sputtering in pure Argon

Thin Solid Films

Volumn 518, Issue 16, 2010, Pages 4619-4622

  Challali, F ^a,c   Besland, M P ^a   Benzeggouta, D ^b   Borderon, C ^a   Hugon, M C ^b   Salimy, S ^a,c   Saubat, J C ^c   Charpentier, A ^c   Averty, D ^a   Goullet, A ^a   Landesman, J P ^a  

^a UNIVERSITÉ DE NANTES   (France)

^b UNIVERSITÉ PARIS SUD   (France)

^c MHS Electronics   (France)

Author keywords

Annealing; BST; Magnetron sputtering; Structural analysis; Thin layer deposition; XPS

Indexed keywords

ANNEALING; ARGON; BARIUM COMPOUNDS; ELECTRODES; MAGNETRON SPUTTERING; PLATINUM COMPOUNDS; RUTHENIUM COMPOUNDS; STRONTIUM COMPOUNDS; STRUCTURAL ANALYSIS; TITANIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

BA0.5SR0.5TIO3; BOTTOM ELECTRODES; CHEMICAL COMPOSITIONS; EX-SITU ANNEALING; INTERFACE FORMATION; RF-MAGNETRON SPUTTERING; THIN-LAYER DEPOSITION; TWO ELECTRODES;

THIN FILMS;

EID: 77955606605     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.12.045     Document Type: Conference Paper

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