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Volumn 518, Issue 21, 2010, Pages 5950-5954
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Synthesis of thermoresponsive poly(N-isopropylacrylamide) brush on silicon wafer surface via atom transfer radical polymerization
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Author keywords
Atom transfer radical polymerization; Poly(N isopropylacrylamide); Polymer brush
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Indexed keywords
AQUEOUS SOLUTIONS;
CHAIN DENSITY;
DE-WETTING;
HOMOGENEOUS POLYMERS;
HOMOPOLYMERS;
IN-SITU;
INNER REGION;
N-ISOPROPYLACRYLAMIDES;
NARROW TEMPERATURE RANGES;
NUMBER-AVERAGE;
POLY-N-ISOPROPYL ACRYLAMIDE;
POLYDISPERSITY INDICES;
POLYMER BRUSH;
POLYMER BRUSHES;
SILICON SURFACES;
SILICON WAFER SURFACE;
SURFACE-INITIATED ATRP;
TEMPERATURE RANGE;
THERMO-RESPONSIVE;
TWO STAGE;
ACRYLIC MONOMERS;
AMIDES;
ANGLE MEASUREMENT;
ATOMIC FORCE MICROSCOPY;
ATOMIC SPECTROSCOPY;
ATOMS;
BRUSHES;
CHROMATOGRAPHIC ANALYSIS;
CONTACT ANGLE;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
FOURIER TRANSFORMS;
FREE RADICAL REACTIONS;
GELS;
LATEXES;
MONOLAYERS;
PHASE TRANSITIONS;
POLYDISPERSITY;
POLYMERIZATION;
POLYMERS;
SCANNING ELECTRON MICROSCOPY;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON WAFERS;
WAVELET TRANSFORMS;
WETTING;
ATOM TRANSFER RADICAL POLYMERIZATION;
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EID: 77955549720
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2010.05.103 Document Type: Article |
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Times cited : (43)
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References (28)
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