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Volumn 10, Issue SUPPL. 3, 2010, Pages
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Chemical surface passivation of silicon nanowires grown by APCVD
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Author keywords
Photovoltics cells; Silicon nanowires; Surface passivations
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Indexed keywords
ATOMIC BONDING;
CHEMICAL SURFACES;
CHEMICAL VAPOUR DEPOSITION;
DILUTE HF;
EFFECTIVE LIFETIME;
FIELD EMISSION SCANNING ELECTRON MICROSCOPY;
HCL SOLUTION;
IN-BETWEEN;
MICROSTRUCTURAL ASPECTS;
P-TYPE SI;
PHOTOCONDUCTANCE;
SILICON NANOWIRES;
SURFACE PASSIVATION;
SURFACE PASSIVATIONS;
ATMOSPHERIC PRESSURE;
ATOMIC SPECTROSCOPY;
CHLORINE;
FIELD EMISSION;
FIELD EMISSION MICROSCOPES;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
FOURIER TRANSFORMS;
HYDROCHLORIC ACID;
NANOWIRES;
PASSIVATION;
POLYVINYL ALCOHOLS;
RAMAN SPECTROSCOPY;
SCANNING ELECTRON MICROSCOPY;
SOLAR CELLS;
WAVELET TRANSFORMS;
SILICON;
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EID: 77955518176
PISSN: 15671739
EISSN: None
Source Type: Journal
DOI: 10.1016/j.cap.2009.12.029 Document Type: Conference Paper |
Times cited : (19)
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References (20)
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