SCOPUS 정보 검색 플랫폼

Microelectronic Engineering

Volumn 87, Issue 11, 2010, Pages 2328-2331

Fabrication of micro-lens arrays with moth-eye antireflective nanostructures using thermal imprinting process

(3) Oh, Sang Soon a Choi, Choon Gi a Kim, Young Sung b

a Electronics and Telecommunications Research Institute (ETRI) (South Korea)

b Sungkyunkwan University (South Korea)

Author keywords

Antireflection; Micro lens arrays; Nanoimprint lithography

Indexed keywords

AFM; ANTI-REFLECTION; ANTIREFLECTIVE NANOSTRUCTURE; IMPRINTING LITHOGRAPHY; IMPRINTING PROCESS; MICRO-LENS; MICRO-LENS ARRAYS; MOTH-EYE STRUCTURE; MOTHEYE; PLASMA TREATMENT; POLYCARBONATE FILMS; SEM IMAGE; THERMAL REFLOW PROCESS; TRANSMITTANCE SPECTRA; UV-VISIBLE SPECTROMETERS;

ANTIREFLECTION COATINGS; FABRICATION; MICROLENSES; NANOIMPRINT LITHOGRAPHY; NANOSTRUCTURES; PHOTOLITHOGRAPHY; PLASMA APPLICATIONS; REACTIVE ION ETCHING;

OPTICAL INSTRUMENTS;

EID: 77955514779 PISSN: 01679317 EISSN: None Source Type: Journal
DOI: 10.1016/j.mee.2010.03.012 Document Type: Article

Times cited : (65)

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