H2/Ar and vacuum annealing effect of ZnO thin films deposited by RF magnetron sputtering system

Current Applied Physics

Volumn 10, Issue SUPPL. 3, 2010, Pages

  Kim, Jwayeon ^a   Kim, Myung Chun ^a   Yu, Jaekeun ^a   Park, Kyeongsoon ^b  

^a Hoseo University   (South Korea)

^b Sejong University   (South Korea)

Author keywords

H2 Ar annealing; Sputter deposition; Vacuum annealing; ZnO film

Indexed keywords

AMBIENTS; ANNEALING TEMPERATURES; CARRIER DENSITY; H2/AR ANNEALING; HYDROGEN DONOR; IN-VACUUM; LOW TEMPERATURES; OPTICAL TRANSMISSIONS; RF-MAGNETRON SPUTTERING; VACUUM AMBIENTS; VACUUM-ANNEALING; ZNO; ZNO FILM; ZNO FILMS; ZNO THIN FILM;

ARGON; LIGHT TRANSMISSION; MAGNETRON SPUTTERING; METALLIC FILMS; OXYGEN; OXYGEN VACANCIES; VACUUM; VACUUM TECHNOLOGY; ZINC; ZINC OXIDE;

ANNEALING;

EID: 77955509924     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2010.02.041     Document Type: Conference Paper

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