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Volumn 646, Issue 1-2, 2010, Pages 68-74
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Copper underpotential deposition on Ru quasi-single-crystal films
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Author keywords
Copper; Cu UPD; Film electrode; Platinum; Ruthenium; Single crystal
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Indexed keywords
ADSORPTION;
CRYSTALLINE MATERIALS;
DESORPTION;
ELECTROCHEMICAL ELECTRODES;
EXPERIMENTS;
FILM PREPARATION;
HEATING;
LANDFORMS;
MONOLAYERS;
OXYGEN;
PLASTIC FILMS;
PLATINUM;
RUTHENIUM;
SINGLE CRYSTAL SURFACES;
SOIL CONSERVATION;
STRIPPING (DYES);
SURFACE STRUCTURE;
ADSORBED OXYGEN;
COMPETITIVE ADSORPTION;
CRYSTALLINE FILMS;
DESORPTION PEAKS;
DIFFUSION CONTROLLED;
FILM ELECTRODES;
LINEAR VARIATION;
NEGATIVE POTENTIAL;
NITROGEN ATMOSPHERES;
PLATINUM-RUTHENIUM;
POTENTIAL DEPOSITION;
POTENTIAL RANGE;
PT SINGLE-CRYSTAL SURFACES;
PT(100);
QUASI-SINGLE-CRYSTAL;
RESISTIVE HEATING;
RU FILM;
SINGLE PEAK;
SINGLE-CRYSTAL SUBSTRATES;
STRUCTURAL PROBES;
TERRACE SITES;
UNDERPOTENTIAL DEPOSITION;
VICINAL SURFACE;
COPPER;
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EID: 77955318061
PISSN: 15726657
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jelechem.2010.02.023 Document Type: Article |
Times cited : (12)
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References (54)
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