Optimization of preparation procedure of LiF:Mg,Cu,Si TLD for improving the reusability

Radiation Measurements

Volumn 45, Issue 3-6, 2010, Pages 583-585

  Kim, J L ^a   Lee, J I ^a   Pradhan, A S ^b   Chang, I ^a   Kim, B H ^a   Chung, K S ^c   Choe, H S ^c  

^a Korea Atomic Energy Research Institute   (South Korea)

^b BHABHA ATOMIC RESEARCH CENTRE   (India)

^c Gyeongsang National University   (South Korea)

Author keywords

LiF:Mg,Cu,Si; Residual signal; Thermoluminescence; TLD

Indexed keywords

GLOW CURVE; HIGH SENSITIVITY; LIF:MG,CU,SI; PREPARATION PROCEDURES; RESIDUAL SIGNALS; TEMPERATURE RANGE; THERMAL STABILITY; THERMAL TREATMENT; TL SENSITIVITY;

HEAT TREATMENT; REUSABILITY; THERMOLUMINESCENCE;

SILICON;

EID: 77955303842     PISSN: 13504487     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.radmeas.2010.02.011     Document Type: Conference Paper

References (4)

1. K.S. Chung, H.S. Choe, J.I. Lee, J.L. Kim, and S.Y. Chang A computer program for the deconvolution of thermoluminescence glow curves Radiat. Prot. Dosimetry 115 2005 345 349
2. J.L. Kim, J.I. Lee, A.S. Pradhan, B.H. Kim, and J.S. Kim Further studies on the dosimetric characteristics of LiF:Mg,Cu,Si - a high sensitivity thermoluminescence dosimeter (TLD) Radiat. Meas. 43 2008 446 449
3. J.I. Lee, J.S. Yang, J.L. Kim, A.S. Pradhan, J.D. Lee, K.S. Chung, and H.S. Choe Dosimetric characteristic of LiF:Mg,Cu,Si thermoluminescent materials Appl. Phys. Lett. 89 2006 094110
4. J.I. Lee, J.L. Kim, J.S. Yang, A.S. Pradhan, B.H. Kim, K.S. Chung, and H.S. Choe Dual-step thermal treatment for the stability of glow curve structure and the TL sensitivity of the newly developed LiF:Mg,Cu,Si Radiat. Meas. 42 2007 597 600