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Volumn 42, Issue 4-5, 2007, Pages 597-600

Dual-step thermal treatment for the stability of glow curve structure and the TL sensitivity of the newly developed LiF:Mg,Cu,Si

Author keywords

Dual step annealing; LiF:Mg,Cu,Si; Thermoluminescence; TLD

Indexed keywords

COPPER; DOSIMETERS; HEAT TREATMENT; HIGH TEMPERATURE EFFECTS; POSITIVE IONS; SENSITIVITY ANALYSIS; THERMOLUMINESCENCE;

EID: 34548270044     PISSN: 13504487     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.radmeas.2007.01.080     Document Type: Article
Times cited : (14)

References (17)
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.