Growth of TiO 2 nanorods on a ta substrate by metal-organic chemical vapor deposition

Journal of Nanoscience and Nanotechnology

Volumn 10, Issue 5, 2010, Pages 3346-3349

  Lee, Kang Suk ^a   Hyun, Jae Sung ^a   Seo, Hyun Ook ^a   Kim, Young Dok ^a   Boo, Jin Hyo ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

MOCVD; Nanorod; Surface characterization; TiO 2

Indexed keywords

FILM STRUCTURE; METALORGANIC CHEMICAL VAPOR DEPOSITION; MOCVD; NANOROD SURFACES; RUTILE PHASE; SAMPLE TEMPERATURE; SEM; SINGLE PRECURSORS; SUBSTRATE TEMPERATURE; TIO; TITANIUM TETRAISOPROPOXIDE; XPS; XRD;

AGGLOMERATION; METALLORGANIC CHEMICAL VAPOR DEPOSITION; ORGANIC CHEMICALS; OXIDE MINERALS; SCANNING ELECTRON MICROSCOPY; STOICHIOMETRY; SUBSTRATES; SURFACE PROPERTIES; TANTALUM; TITANIUM; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

NANORODS;

EID: 77954982731     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2010.2305     Document Type: Conference Paper

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