|
Volumn 35, Issue 9, 2010, Pages 1311-1313
|
Analysis of microstructural relaxation phenomena in laser-modified fused silica using confocal Raman microscopy
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ACTIVATION ENTHALPIES;
CONFOCAL RAMAN MICROSCOPY;
FICTIVE TEMPERATURES;
FINITE-ELEMENT MODELS;
FOURIER;
HEATING CONDITIONS;
HIGH FREQUENCY HF;
MICRO-STRUCTURAL;
MICROSTRUCTURAL CHANGES;
MODIFIED SILICA;
OPTIC PHONON;
REASONABLE VALUE;
RELAXATION PARAMETER;
RELAXATION PHENOMENA;
SPATIALLY RESOLVED;
TIME HISTORY;
FINITE ELEMENT METHOD;
HEATING;
LASER HEATING;
OXIDES;
SILICA;
SILICON COMPOUNDS;
FUSED SILICA;
|
EID: 77954922981
PISSN: 01469592
EISSN: 15394794
Source Type: Journal
DOI: 10.1364/OL.35.001311 Document Type: Article |
Times cited : (27)
|
References (21)
|