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Volumn 35, Issue 9, 2010, Pages 1311-1313

Analysis of microstructural relaxation phenomena in laser-modified fused silica using confocal Raman microscopy

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENTHALPIES; CONFOCAL RAMAN MICROSCOPY; FICTIVE TEMPERATURES; FINITE-ELEMENT MODELS; FOURIER; HEATING CONDITIONS; HIGH FREQUENCY HF; MICRO-STRUCTURAL; MICROSTRUCTURAL CHANGES; MODIFIED SILICA; OPTIC PHONON; REASONABLE VALUE; RELAXATION PARAMETER; RELAXATION PHENOMENA; SPATIALLY RESOLVED; TIME HISTORY;

EID: 77954922981     PISSN: 01469592     EISSN: 15394794     Source Type: Journal    
DOI: 10.1364/OL.35.001311     Document Type: Article
Times cited : (27)

References (21)
  • 17


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.