Fictive temperature measurement of amorphous SiO2 films by IR method

Journal of Non-Crystalline Solids

Volumn 352, Issue 36-37, 2006, Pages 3929-3935

  Ryu, S R ^a   Tomozawa, M ^a  

^a RENSSELAER POLYTECHNIC INSTITUTE   (United States)

Author keywords

FTIR measurements; Glass transition; Optical spectroscopy; Oxide glasses; Silica; Structural relaxation

Indexed keywords

AMORPHOUS MATERIALS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GLASS; GLASS TRANSITION; INFRARED RADIATION; OXIDES; THERMAL EFFECTS; THIN FILMS;

FTIR MEASUREMENTS; OPTICAL SPECTROSCOPY; OXIDE GLASSES; SILICA FILMS; STRUCTURAL RELAXATION;

SILICA;

EID: 33748320781     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnoncrysol.2006.07.005     Document Type: Article

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