SCOPUS 정보 검색 플랫폼

Transactions of the Institute of Metal Finishing

Volumn 88, Issue 3, 2010, Pages 154-157

Analysis of thin impurity doped layers in anodic alumina and anodic tantala films by glow discharge time-of-flight mass spectrometry

(6) Molchan, I S a Thompson, G E a Skeldon, P a Trigoulet, N a Tempez, A b Chapon, P b

a UNIVERSITY OF MANCHESTER (United Kingdom)

b HORIBA LTD (Japan)

Author keywords

Anodic alumina; Anodic tantala; Glow discharge time of flight mass spectrometry; Thin films

Indexed keywords

ACQUISITION SYSTEMS; ANODIC ALUMINA; ANODIC FILMS; ANODIC OXIDE FILM; ANODIC TANTALA; DEPTH DISTRIBUTION; DEPTH-PROFILING ANALYSIS; DOPED LAYERS; ELEMENTAL DISTRIBUTION; HIGH INTENSITY; HIGH RESOLUTION; IMPURITIES IN; ION SIGNALS; IONISATION; RF GLOW DISCHARGE; RF PULSE;

ALUMINUM SHEET; CHROMIUM; CONDUCTIVE FILMS; COPPER; DEPTH PROFILING; GLOW DISCHARGES; IMPURITIES; MASS SPECTROMETERS; MASS SPECTROMETRY; METALLIC FILMS; NEGATIVE IONS; TANTALUM; THIN FILMS;

OXIDE FILMS;

EID: 77954915019 PISSN: 00202967 EISSN: None Source Type: Journal
DOI: 10.1179/174591910X12692576434617 Document Type: Conference Paper

Times cited : (13)

References (11)

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2
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7
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8
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9
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- L. Iglesias-Rubianes, P. Skeldon, G. E. Thompson, U. Kreissig, D. Grambole, H. Habazaki and K. Shimizu: Thin Solid Films, 2003, 424, 201-207.
- (2003) Thin Solid Films , vol.424 , pp. 201-207
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10
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11
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- (1996) Philos. Mag. B , vol.73 B , pp. 461-485
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.