메뉴 건너뛰기




Volumn 6, Issue SUPPL. 1, 2009, Pages

Simulation of the substrate temperature field for plasma assisted chemical etching

Author keywords

Computer modeling; Plasma jet; Surface temperature

Indexed keywords

CHEMICAL ETCHING; COMPREHENSIVE METHOD; COMPUTER MODELING; MATERIAL REMOVAL RATE; MODEL PARAMETERS; MOVING HEAT SOURCES; OPTICAL ELEMENTS; PROCESS SIMULATIONS; PURE CHEMICALS; REACTIVE PLASMAS; SUBSTRATE TEMPERATURE; SURFACE FIGURING; SURFACE TEMPERATURE DISTRIBUTION; SURFACE TEMPERATURES; TRANSIENT HEAT TRANSFER; WORK PIECES;

EID: 77954911802     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200930509     Document Type: Conference Paper
Times cited : (27)

References (14)
  • 13
    • 77954917710 scopus 로고    scopus 로고
    • Comsol Multiphysics™
    • Comsol Multiphysics™: http://www.comsol.com.
  • 14
    • 0345597873 scopus 로고    scopus 로고
    • J. H. Lienhard , IV, J. H. Lienhard , V, Eds., Phlogiston Press, Cambridge
    • J. H. Lienhard , IV, J. H. Lienhard , V, Eds., "A Heat Transfer Textbook", Phlogiston Press, Cambridge 2008.
    • (2008) A Heat Transfer Textbook


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.