Study of inductive coupled hydrogen and argon plasma interaction with SiO2 glass

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Skudra, Atis ^a   Revalde, Gita ^a   Gavare, Zanda ^a   Zorina, Natalia ^a  

^a UNIVERSITY OF LATVIA   (Latvia)

Author keywords

Adsorption; Atomic force microscopy (afm); Hf discharges; Inductively coupled argon hydrogen plasma; Optical spectroscopy; Plasma treatment; Surface modification

Indexed keywords

ARGON-HYDROGEN PLASMAS; INDUCTIVELY-COUPLED; OPTICAL SPECTROSCOPY; PLASMA TREATMENT; SURFACE MODIFICATION;

ADSORPTION; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ELECTROMAGNETIC INDUCTION; GLASS; HAFNIUM; HYDROGEN; LIGHT SOURCES; MOLECULES; OXYGEN; PLASMA APPLICATIONS; PLASMA INTERACTIONS; SILICON COMPOUNDS; SURFACE DISCHARGES; SURFACE TREATMENT; VOLTAGE DIVIDERS;

ARGON;

EID: 77954889716     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200930508     Document Type: Conference Paper

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