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Volumn 4, Issue SUPPL.1, 2007, Pages
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Study of the high-frequency inductive coupled discharge plasma interaction with walls
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Author keywords
Atomic force microscopy (AFM); Low pressure discharges; Modification; Optical emission spectroscopy (OES); Plasma treatment; Surface modification
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Indexed keywords
ATOMIC FORCE MICROSCOPY (AFM);
LOW-PRESSURE DISCHARGES;
MODIFICATION;
PLASMA TREATMENT;
SURFACE MODIFICATION;
ATOMIC FORCE MICROSCOPY;
ATOMIC SPECTROSCOPY;
EMISSION SPECTROSCOPY;
HELIUM;
LEAKAGE (FLUID);
LIGHT;
LIGHT EMISSION;
LIGHT SOURCES;
OPTICAL EMISSION SPECTROSCOPY;
OPTICAL MICROSCOPY;
OXYGEN;
PHOTORESISTS;
PLASMA APPLICATIONS;
PLASMA INTERACTIONS;
PLASMA THEORY;
SURFACE DISCHARGES;
SURFACE STRUCTURE;
SURFACE TREATMENT;
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EID: 70349419694
PISSN: 16128850
EISSN: 16128869
Source Type: Journal
DOI: 10.1002/ppap.200732322 Document Type: Conference Paper |
Times cited : (3)
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References (10)
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