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Nanoscale

Volumn 2, Issue 7, 2010, Pages 1203-1207

Pt surface modification of SnO2 nanorod arrays for CO and H 2 sensors

(6) Huang, Hui a Ong, C Y a Guo, J b White, T b,c Tse, M S a Tan, O K a

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

c AUSTRALIAN NATIONAL UNIVERSITY (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION TECHNIQUE; DIP COATING; FABRICATION PROCESS; GOOD COMPATIBILITY; LOW DEPOSITION TEMPERATURE; MICROELECTRONIC PROCESS; NANOROD ARRAYS; OPTIMAL VALUES; PROMOTION EFFECTS; PT MODIFICATION; PT NANOPARTICLES; SCALE-UP; SENSING PERFORMANCE; SENSING PROPERTY; SENSING RESPONSE; SI WAFER; SURFACE MODIFICATION; WORKING TEMPERATURES;

COATINGS; MICROELECTRONICS; OPTIMIZATION; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLATINUM; SEMICONDUCTING SILICON COMPOUNDS; SENSORS; SILICON WAFERS;

NANORODS;

CARBON MONOXIDE; HYDROGEN; NANOTUBE; PLATINUM; SILICON DIOXIDE;

ARTICLE; CHEMISTRY; METHODOLOGY; NANOTECHNOLOGY; SURFACE PROPERTY; TEMPERATURE; ULTRASTRUCTURE;

CARBON MONOXIDE; HYDROGEN; NANOTECHNOLOGY; NANOTUBES; PLATINUM; SILICON DIOXIDE; SURFACE PROPERTIES; TEMPERATURE;

EID: 77954602666 PISSN: 20403364 EISSN: 20403372 Source Type: Journal
DOI: 10.1039/c0nr00159g Document Type: Article

Times cited : (63)

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