SnO2 nanorods prepared by inductively coupled plasma-enhanced chemical vapor deposition

IEEE Transactions on Nanotechnology

Volumn 6, Issue 4, 2007, Pages 465-467

  Lee, Y C ^b   Tan, O K ^a,b   Huang, Hui ^b   Tse, M S ^b   Lau, H W ^b  

^a IEEE

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Nanorods; Plasma enhanced chemical vapor deposition (PECVD); SnO2

Indexed keywords

INDUCTIVELY COUPLED PLASMA; NANORODS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICA; SINGLE CRYSTALS; TRANSMISSION ELECTRON MICROSCOPY;

DIBUTYLTIN DIACETATE (DBTDA); NEEDLE-SHAPED NANORODS; SUBSTRATE DISTANCE;

TIN DIOXIDE;

EID: 34547312024     PISSN: 1536125X     EISSN: None     Source Type: Journal    
DOI: 10.1109/TNANO.2007.897870     Document Type: Article

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