In-die registration metrology on future generation reticles

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7272, Issue , 2009, Pages

  Roeth, Klaus Dieter ^b   Laske, Frank ^b   Kinoshita, Hiroshi ^a   Kenmochi, Daisuke ^a   Schmidt, Karl Heinrich ^b   Adam, Dieter ^b  

^a HOYA CORPORATION   (Japan)

^b KLA TENCOR CORPORATION   (United States)

Author keywords

Advanced reticles; Double patterning; In die measurement; Lithography; LMS IPRO4; Registration metrology

Indexed keywords

ADVANCED RETICLES; DOUBLE PATTERNING; IN-DIE MEASUREMENT; LMS IPRO4; REGISTRATION METROLOGY;

DIES; LITHOGRAPHY; OPTICAL INSTRUMENTS; PROCESS CONTROL; TESTING;

MEASUREMENTS;

EID: 66649137108     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.813944     Document Type: Conference Paper

References (3)

1. th International Symposium on Immersion Lithography Extensions, 2008
2. K-D Roeth, G. Antesberger, C. Enkrich, F. Laske, D. Adam: Registration Metrology for 45nm Node Reticles, Semi Technology Seminar Dec. 2007
3. Ch. Enkrich, G. Antesberger, O. Loeffler, K-D. Roeth, F. Laske, K-H. Schmidt, D. Adam: Registration Measurement Capability of Vistee LMS IPR04 with Focus on Small Features, Photomask Japan, Proceedings of SPIE Vol. 7028, 2008