In-die mask registration metrology for 32nm node DPT lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7379, Issue , 2009, Pages

  Roeth, Klaus Dieter ^a   Laske, Frank ^a   Heiden, Michael ^a   Adam, Dieter ^a   Boesser, Artur ^a   Rinn, Klaus ^b   Schepp, André ^b   Bender, Jochen ^a  

^a KLA TENCOR CORPORATION   (United States)

^b TECHNISCHE HOCHSCHULE MITTELHESSEN   (Germany)

Author keywords

Advanced reticles; Double Patterning Lithography; In die measurement; LMS IPRO4; Registration Metrology

Indexed keywords

ADVANCED RETICLES; DOUBLE PATTERNING LITHOGRAPHY; IN-DIE MEASUREMENT; LMS IPRO4; REGISTRATION METROLOGY;

DIES; EDGE DETECTION; LOGIC DESIGN; MASKS; NANOTECHNOLOGY; OPTICAL INSTRUMENTS; PARALLEL ALGORITHMS; SEMICONDUCTOR DEVICE MANUFACTURE;

MEASUREMENTS;

EID: 69949187277     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.824282     Document Type: Conference Paper

References (5)

1. ITRS Roadmap 2007 and update 2008, http://www.itrs.net/Links/2008ITRS/ Update/2008-Update.pdf.
2. K-D. Roeth, F. Laske, H. Kinoshita, D. Kenmochi, K-H. Schmidt, D. Adam: In-Die Registration Metrology on Future Generation Reticles, Proceedings of SPIE Vol. 7272, 2009
3. M. Higuchi, T. Aihara, H. Saito, I. Yonekura, J. Suzuki, E. Gallagher, I. Stobert Exploring New Metrology for Complex Photomask Patterns, Proc. SPIE, Vol.7122, 71222S (2008)
4. th EMLC 2009
5. th EMLC 2009