Critical dimension uniformity using reticle inspection tool

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7488, Issue , 2009, Pages

  Wylie, Mark ^b   Hutchinson, Trent ^b   Pan, Gang ^b   Vavul, Thomas ^b   Miller, John ^b   Dayal, Aditya ^b   Hess, Carl ^b   Green, Mike ^a   Hedges, Shad ^a   Chalom, Dan ^a   Rudzinski, Maciej ^a   Wood, Craig ^a   McMurran, Jeff ^a  

^a PHOTRONICS INC   (United States)

^b KLA TENCOR CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

45-NM HALF-PITCH; ACTIVE MECHANISM; ATTENUATED PHASE SHIFT MASKS; BASIC THEORY; CDS; CRITICAL DIMENSION UNIFORMITIES; CURRENT CAPABILITY; CYCLE TIME; DATA SETS; ENGINEERING ANALYSIS; HIGH NA; HIGH THROUGHPUT; INDUSTRY STANDARDS; INTENSITY-BASED; LEADING EDGE; MASK MAKERS; MASK MANUFACTURING; MASK PROCESS; MASK WRITER; NONUNIFORMITY; OPTICAL MASK; PATTERNING PROCESS; PROCESS OF RECORDS; RETICLE INSPECTION; ROADMAP; TARGET VALUES; TYPICAL APPLICATION;

INSPECTION; INSPECTION EQUIPMENT; OPTICAL INSTRUMENTS; SPECIFICATIONS;

PHOTOMASKS;

EID: 77954411145     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.830148     Document Type: Conference Paper

References (5)

1. International Technology Roadmap for Semiconductors, Lithography (2008)
2. Chen, C.J., et al., "Global CD Uniformity Improvement Using Dose Modulation and Pattern Correction of Pattern Density-Dependent and Position-Dependent Errors," Proc. SPIE 5446, (2004)
3. Dayal, A., et al., "Results from the KLA-Tencor TeraScanXR reticle inspection tool," Proc. SPIE 7122, (2008)
4. KLA-Tencor LMW9045 - Advanced Mask CD SEM Metrology System Product Specification
5. Yongkyoo Choi., et al., "The study to enhance the mask global CD uniformity by removing local CD variation," Proc. SPIE 6518, 65183E (2007)