Global CD uniformity improvement using dose modulation and pattern correction of pattern density-dependent and position-dependent errors

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5446, Issue PART 1, 2004, Pages 28-37

  Chen, Chia Jen ^a   Lee, Hsin Chang ^a   Yeh, Lee Chih ^a   Liu, Kai Chung ^a   Lien, Ta Cheng ^a   Chuo, Yi Chun ^a   Hsieh, Hung Chang ^a   Lin, Burn J ^a  

^a TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Aberration compensation and mask CD uniformity; Dose assignment; Fogging effect; Loading effect

Indexed keywords

ABERRATIONS; DATA REDUCTION; DRY ETCHING; ERROR ANALYSIS; MODULATION; PHOTOLITHOGRAPHY; QUARTZ APPLICATIONS;

ABERRATION COMPENSATION; DOSE ASSIGNMENT; FOGGING EFFECT; LOADING EFFECT; MASK CD UNIFORMITY;

PATTERN RECOGNITION;

EID: 11844292042     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.557676     Document Type: Conference Paper

References (5)

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