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Volumn 7, Issue 2, 2010, Pages 326-329
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ZnO films deposited by optimized PLD technique with bias voltages
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Author keywords
[No Author keywords available]
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Indexed keywords
DEPOSITION TEMPERATURES;
EMISSION INTENSITY;
HIGH ENERGY;
HIGH QUALITY;
MAXIMUM VALUES;
MINIMUM VALUE;
NEAR BAND EDGE EMISSIONS;
NON-RADIATIVE RECOMBINATIONS;
OXYGEN AMBIENT;
PHOTOLUMINESCENCE INTENSITIES;
PL INTENSITY;
PLD TECHNIQUE;
STOICHIOMETRIC COMPOSITIONS;
X RAY SPECTRUM;
ZNO FILMS;
BIAS VOLTAGE;
METALLIC FILMS;
NANOSCIENCE;
OPTIMIZATION;
OXYGEN;
PULSED LASER DEPOSITION;
PULSED LASERS;
X RAY ANALYSIS;
X RAY SPECTROGRAPHS;
ZINC OXIDE;
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EID: 77954344930
PISSN: 18626351
EISSN: 16101642
Source Type: Journal
DOI: 10.1002/pssc.200982493 Document Type: Conference Paper |
Times cited : (7)
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References (10)
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