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Volumn 7, Issue 2, 2010, Pages 326-329

ZnO films deposited by optimized PLD technique with bias voltages

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION TEMPERATURES; EMISSION INTENSITY; HIGH ENERGY; HIGH QUALITY; MAXIMUM VALUES; MINIMUM VALUE; NEAR BAND EDGE EMISSIONS; NON-RADIATIVE RECOMBINATIONS; OXYGEN AMBIENT; PHOTOLUMINESCENCE INTENSITIES; PL INTENSITY; PLD TECHNIQUE; STOICHIOMETRIC COMPOSITIONS; X RAY SPECTRUM; ZNO FILMS;

EID: 77954344930     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200982493     Document Type: Conference Paper
Times cited : (7)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.