Angle-resolved XPS depth profiling of modeled structures: Testing and improvement of the method

Surface and Interface Analysis

Volumn 42, Issue 6-7, 2010, Pages 649-652

  Polčák, Josef ^a   Čechal, Jan ^a   Bábor, Petr ^a   Urbánek, Michal ^a   Průša, Stanislav ^a   Šikola, Tomáš ^a  

^a BRNO UNIVERSITY OF TECHNOLOGY   (Czech Republic)

Author keywords

Angle resolved X ray photoelectron spectroscopy; Concentration depth profile; Genetic algorithms; Thin films

Indexed keywords

ANGLE RESOLVED X RAY PHOTOELECTRON SPECTROSCOPY; ANGLE-RESOLVED XPS; CONCENTRATION-DEPTH PROFILE; DETECTION ANGLE; ELECTRON SPECTRUM; PHOTOELECTRON SIGNALS; RELATIVE INTENSITY; RESOLUTION LIMITS; SHARP INTERFACE; SI SUBSTRATES; SUB-LAYERS; ULTRATHIN LAYERS; XPS;

ELECTRONS; GENETIC ALGORITHMS; PHOTOELECTRICITY; PHOTOIONIZATION; PHOTONS; SILICON COMPOUNDS; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPTH PROFILING;

EID: 77954299975     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3361     Document Type: Conference Paper

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