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Volumn 502, Issue 1, 2010, Pages 1-4
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Fabrication and magnetic properties of Fe-6.5% Si alloys by magnetron sputtering method
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Author keywords
Diffusion; Fe 6.5 Si alloys; Physical vapor deposition; SEM; TEM
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Indexed keywords
ANNEALING PROCESS;
BCC STRUCTURE;
DIRECT CURRENT MAGNETRON SPUTTERING;
FE-6.5% SI ALLOYS;
FE-SI ALLOYS;
IRON LOSS;
LAYER THICKNESS;
MAGNETRON SPUTTERING METHOD;
SEM;
SI ALLOYS;
TEM;
TRANSMISSION ELECTRON MICROSCOPE;
UNIFORM MICROSTRUCTURE;
VACUUM-ANNEALING;
X RAY DIFFRACTOMETERS;
CRYSTAL STRUCTURE;
DC POWER TRANSMISSION;
IRON ALLOYS;
MAGNETIC PROPERTIES;
PHYSICAL VAPOR DEPOSITION;
SILICON;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY MICROSCOPES;
SILICON ALLOYS;
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EID: 77954219001
PISSN: 09258388
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jallcom.2010.02.175 Document Type: Article |
Times cited : (55)
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References (24)
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