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Volumn 41, Issue 7, 1999, Pages 729-735

Si enrichment of conventional electrical steel by means of physical vapour deposition

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ANNEALING; DELAMINATION; DENSITY (SPECIFIC GRAVITY); DIFFUSION; INTERMETALLICS; PHASE DIAGRAMS; SILICON; SPUTTER DEPOSITION; STEEL; THERMAL EFFECTS; VAPOR DEPOSITION;

EID: 0032691253     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6462(99)00208-0     Document Type: Article
Times cited : (7)

References (23)
  • 1
    • 85031622258 scopus 로고
    • EPRI Project Number RP3070-24
    • F. E. Werner, CMP Report, No. 91-11, EPRI Project Number RP3070-24 (1991).
    • (1991) CMP Report , vol.91 , Issue.11
    • Werner, F.E.1
  • 4
    • 0004128136 scopus 로고
    • 81, Van Nostrand, New York
    • R. H. Bozorth, Ferromagnetism, pp. 75, 81, Van Nostrand, New York (1951).
    • (1951) Ferromagnetism , pp. 75
    • Bozorth, R.H.1
  • 11
    • 85031626901 scopus 로고    scopus 로고
    • Patent No. US5061326 (1990)
    • J. W. Shoen (Armco), Patent No. US5061326 (1990).
    • Shoen, J.W.1
  • 13
    • 85031620048 scopus 로고    scopus 로고
    • Patent No. US4832762, patent application date March 3, 1986
    • K. Nakaoka, Y. Takada, and Y. Tanaka, Patent No. US4832762, patent application date March 3, 1986.
    • Nakaoka, K.1    Takada, Y.2    Tanaka, Y.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.