Microphase separation in thin films of supramolecular assemblies composed of a triblock copolymer and low-molecular-weight additive

Journal of Polymer Science, Part B: Polymer Physics

Volumn 48, Issue 14, 2010, Pages 1594-1605

  Nandan, Bhanu ^a  

^a LEIBNIZ INSTITUTE OF POLYMER RESEARCH DRESDEN   (Germany)

Author keywords

Atomic force microscopy (AFM); Block copolymers; Phase behavior; SAXS; Self assembly; Supramolecular structures; Templates

Indexed keywords

4-VINYLPYRIDINE; ATOMIC FORCE MICROSCOPY (AFM); BENZOIC ACID; DIBLOCK COPOLYMER; DIBLOCKS; DOMAIN ORIENTATION; DOMAIN SPACING; IN-PLANE ORIENTATION; LAMELLAR MICRODOMAINS; LOW MOLECULAR WEIGHT; MICRO-DOMAINS; MOLAR RATIO; MOLECULAR ARCHITECTURE; MONOMER UNITS; MORPHOLOGICAL TRANSITIONS; PERPENDICULAR ORIENTATION; POLY(4-VINYL PYRIDINE); PS-B-P4VP; SUPRAMOLECULAR ASSEMBLIES; SUPRAMOLECULAR STRUCTURE; TRIBLOCK COPOLYMERS; TRIBLOCKS;

ARCHITECTURE; ATOMIC FORCE MICROSCOPY; BLOCK COPOLYMERS; COPOLYMERIZATION; ETHERS; MICROPHASE SEPARATION; NORMAL DISTRIBUTION; PHASE BEHAVIOR; PLASTIC PRODUCTS; POLYSTYRENES; SELF ASSEMBLY; SUPRAMOLECULAR CHEMISTRY; THIN FILMS; VAPOR DEPOSITION;

MOLECULAR ORIENTATION;

EID: 77953956107     PISSN: 08876266     EISSN: 10990488     Source Type: Journal    
DOI: 10.1002/polb.22050     Document Type: Article

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