Comparison of Y-doped Bazro3 thin films for high temperature humidity sensors by RF sputtering and pulsed laser deposition

Sensors and Actuators, B: Chemical

Volumn 148, Issue 1, 2010, Pages 173-180

  Chen, XiaoXin ^a   Rieth, Loren ^a   Miller, Mark S ^a   Solzbacher, Florian ^a,b  

^a University of Utah   (United States)

^b UNIVERSITY OF UTAH   (United States)

Author keywords

High temperature; Humidity; PLD; Sputtering; Thin film; Y doped BaZrO3

Indexed keywords

CONCENTRATION OF; DEPOSITION PARAMETERS; FILM PARAMETERS; HIGH TEMPERATURE; HOLE CONDUCTION; HUMIDITY; MECHANICAL FILMS; OXYGEN-ION CONDUCTION; PLD DEPOSITION; POST-ANNEAL; PROCESS WINDOW; PROCESSING PARAMETERS; PULSED LASER; RF-SPUTTERING; ROOM TEMPERATURE; SENSING PROPERTY; SENSOR RESPONSE TIME; SPUTTERED THIN FILMS; SUBSTRATE TEMPERATURE; THICK SAMPLES; THIN FILM MATERIAL; Y-DOPED;

ACTIVATION ENERGY; ANNEALING; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; BARIUM; BARIUM COMPOUNDS; CONCENTRATION (PROCESS); ELECTRIC PROPERTIES; MECHANICAL PROPERTIES; MOISTURE; OXYGEN; OXYGEN VACANCIES; PRESSURE MEASUREMENT; PULSED LASER DEPOSITION; PULSED LASERS; SENSORS; STOICHIOMETRY; STRESSES; THIN FILMS; VAPOR DEPOSITION; WATER VAPOR; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION;

EID: 77953914575     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2010.03.074     Document Type: Article

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