High-speed deposition of Y-Si-O films by laser chemical vapor deposition using Nd:YAG laser

Surface and Coatings Technology

Volumn 204, Issue 23, 2010, Pages 3846-3850

  Ito, Akihiko ^a   Endo, Jun ^a   Kimura, Teiichi ^a   Goto, Takashi ^a  

^a TOHOKU UNIVERSITY   (Japan)

Author keywords

Coating; Laser CVD; Microstructure; Rare earth silicate

Indexed keywords

CHAMBER PRESSURE; COLUMNAR GRAIN; DEPOSITION TEMPERATURES; HIGH-SPEED; LASER CHEMICAL VAPOR DEPOSITION; LASER CVD; LASER POWER; MIXTURE PHASE; ND : YAG LASERS; RARE-EARTH SILICATE; SINGLE PHASE; TETRA-ETHYL-ORTHO-SILICATE; Y(DPM)3;

AMORPHOUS FILMS; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; COATINGS; FILM PREPARATION; MICROSTRUCTURE; MIXTURES; NEODYMIUM; SILICATES;

NEODYMIUM LASERS;

EID: 77953913088     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.04.066     Document Type: Article

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