Micro fluid contact printing of sol-gel-derived in-situ formed catalysts for the structured growth of carbon nanotubes

Surface and Coatings Technology

Volumn 204, Issue 21-22, 2010, Pages 3647-3651

  Dittert, Bernd ^a   Bergmair, Iris ^a   Haubner, Roland ^b   Schöftner, Rainer ^a  

^a PROFACTOR GMBH   (Austria)

^b VIENNA UNIVERSITY OF TECHNOLOGY   (Austria)

Author keywords

FCP; Carbon nanotubes; Catalyst; CNT growth; CVD; Sol gel ink

Indexed keywords

CATALYST SYSTEM; CNT GROWTH; CONTACT PRINTING; HOT FILAMENT CVD; IN-SITU; IRON-DOPED ALUMINA; MICRO-FLUID; NOVEL METHODS; ORMOCER; QUARTZ GLASS;

CATALYSTS; GELS; INK; MULTIWALLED CARBON NANOTUBES (MWCN); OXIDE MINERALS; PRINTING; QUARTZ; SOL-GEL PROCESS; SOL-GELS; SOLS; TITANIUM DIOXIDE;

CARBON NANOTUBES;

EID: 77953705206     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.04.045     Document Type: Article

References (29)

1. Davis W.R., Slawson R.J., Rigby G.R. Nature 1953, 171:756.
2. Robinovich E.Ya., Rodionov A.V., Vsesoyuz Trudy Nauch. Issledovatel. Inst. Prirod. Gazov 1959, 6:37.
3. Walker P.L., Rakszawski J.F., Imperial G.R. J. Phys. Chem. 1959, 63:133.
4. M. Endo, PhD thesis, University of Orleans, Orleans, France (1975) (in French).
5. Iijima S. J. Cryst. Growth 1980, 55:675.
6. Oberlin A., Endo M., Koyama T. J. Cryst. Growth 1976, 32:335.
7. Iijima S. J. Cryst. Growth 1980, 55:675.
8. Krüger A. Neue Kohlenstoffmaterialien 2007, Teubner, Stuttgart.
9. Lupo F., Endo M., Rühle M. Chem. Phys. Lett. 2005, 410:384.
10. Xiong G., Wang D., Ren Z. Carbon 2006, 44:969.
11. Kleinsorge B., Golovko V.B., Johnson B. Chem. Commun. 2004, 12:1416.
12. Kukovecz A., Konya Z., Kiricsi I. Phys. Chem. Chem. Phys. 2000, 2:3071.
13. Haubner R., Schwinger W., Schöftner R. Diam. Relat. Mater. 2008, 17:1452.
14. Su C., Lin C., Hung C. Surf. Coat. Technol. 2006, 200:3211.
15. Wirth C.T., Hofmann S., Robertson J. Diam. Relat. Mater. 2008, 17:1518.
16. Zhang C., Pisana S., Wirth C.T., Parvez A., Ducati C., Hofmann S., Robertson J. Diam. Relat. Mater. 2008, 17:1447.
17. Bechinger C., Muffler H., Leiderer P. Thin Solid Films 2000, 366:135.
18. Lee J., Woo S., Jung D. Bull. Korean Chem. Soc. 2003, 24:183.
19. Marzolin C., Smith S., Whitesides G. Adv. Mater. 1998, 10:571.
20. Golovko V., Kleinsorge B., Robertson J., Johnson B. Diam. Relat. Mater. 2006, 15:1023.
21. Wang M., Braun H., Meyer E. Chem. Mater. 2002, 14:4812.
22. Yoldas B. Am. Ceram. Soc. Bull. 1975, 54:289.
23. Nofz M., Stösser R., Schultze D. J. Eur. Ceram. Soc. 2005, 25:1095.
24. www.microresist.de.
25. Schwinger W., Lausecker E., Bergmair I., Schöftner R. Microelectron. Eng. 2008, 85:1346.
26. Bergmair I., Mühlberger M., Schöftner R., Gusenbauer M., Hingerl K. Microelectron. Eng. 2008, 85:822.
27. Khaleel A. Colloids Surf., A 2009, 346:130.
28. Saensunon B., Stewart G.A., Pax R. Int. J. Miner. Process. 2008, 86:26.
29. Huang Y., Xue D., Zhou P., Ma Y., Li F. Mater. Eng. 2003, A359:332.