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Volumn 371, Issue 1-2, 2009, Pages 179-190

Effect of oxygen and nitrogen concentration of nitrogen doped TiO x film as photocatalyst prepared by reactive sputtering

(4) Lee, Seon Hong a Yamasue, Eiji a Okumura, Hideyuki a Ishihara, Keiichi N a

a KYOTO UNIVERSITY (Japan)

Author keywords

Nitric oxidation decomposition; Nitrogen doping; Oxygen deficiency; Photocatalyst; Titanium dioxide

Indexed keywords

CATALYSIS; DOPING (ADDITIVES); ENERGY GAP; FILM PREPARATION; FLOW OF GASES; MAGNETRONS; OPTICAL LATTICES; OPTICAL PROPERTIES; OXYGEN; PHOTOCATALYSIS; PHOTOCATALYSTS; REACTIVE SPUTTERING; SEMICONDUCTOR DOPING; SPUTTERING; SURFACE PROPERTIES; TITANIUM DIOXIDE;

DEFECT FORMATION ENERGIES; NITROGEN-DOPING; OXYGEN AND NITROGENS; OXYGEN CONCENTRATIONS; OXYGEN DEFICIENCY; PHOTOCATALYTIC PROPERTY; RADIO-FREQUENCY (RF) MAGNETRON; VISIBLE-LIGHT PHOTOCATALYSIS;

NITROGEN;

EID: 77953650674 PISSN: 0926860X EISSN: None Source Type: Journal
DOI: 10.1016/j.apcata.2009.10.011 Document Type: Article

Times cited : (45)

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