TiO2 films in the rutile and anatase phases produced by inductively coupled RF plasmas

Surface and Coatings Technology

Volumn 204, Issue 18-19, 2010, Pages 3078-3081

  Valencia Alvarado, R ^a   Lopez Callejas R ^a,b   Barocio, S R ^a   Mercado Cabrera, A ^a   Pena Eguiluz R ^a   Munoz Castro A E ^a   de la Piedad Beneitez, A ^b   de la Rosa Vazquez J M ^c  

^a INSTITUTO NACIONAL DE INVESTIGACIONES NUCLEARES   (Mexico)

^b INSTITUTO TECNOLÓGICO DE TOLUCA   (Mexico)

^c INSTITUTO POLITÉCNICO NACIONAL   (Mexico)

Author keywords

Biomaterials; High frequency and RF discharges; Raman spectroscopy in chemical analysis; X ray measurements

Indexed keywords

ANATASE FILMS; ANATASE PHASE; CHARACTERISATION; DIRECT CURRENT SUPPLY; EXPERIMENTAL CONDITIONS; GLASS VESSEL; HIGH FREQUENCY HF; INDUCTIVELY COUPLED RF PLASMA; INDUCTIVELY-COUPLED; ION ACCELERATIONS; PLASMA OXIDATION; PLASMA PARAMETER; PLASMA PARTICLES; RADIO FREQUENCY GENERATORS; RF DISCHARGE; RUTILE AND ANATASE; RUTILE FILMS; RUTILE FORMATION; SEM; SUBSTRATE TEMPERATURE; TEMPERATURE RISE; TIO; TITANIUM TARGETS; X-RAY MEASUREMENTS;

BIOLOGICAL MATERIALS; CHEMICALS; ELECTROMAGNETIC INDUCTION; GLASS; OXIDE MINERALS; PLASMAS; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SPECTRUM ANALYSIS; SUBSTRATES; TARGETS; TITANIUM; TITANIUM DIOXIDE; X RAY DIFFRACTION; X RAYS;

ELECTRIC DISCHARGES;

EID: 77953361181     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.02.059     Document Type: Article

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