Characterization on pulsed laser deposited nanocrystalline ZnO thin films

Vacuum

Volumn 84, Issue 10, 2010, Pages 1199-1203

  Venkatachalam, S ^a   Kanno, Yoshinori ^b   Velumani, S ^c  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

^b TOKYO METROPOLITAN UNIVERSITY   (Japan)

^c DEPARTAMENTO DE FÍSICA   (Mexico)

Author keywords

AFM; Optical transmittance; PLD; Thin films; XPS; XRD

Indexed keywords

ABSORPTION EDGES; AFM; DEPOSITED FILMS; LASER ENERGY DENSITY; NANOCRYSTALLINE ZNO; NANOCRYSTALLINES; OPTICAL TRANSMITTANCE; OPTICAL TRANSMITTANCE SPECTRUM; OXYGEN ATOM; PULSED LASER; ROOT MEAN SQUARE ROUGHNESS; SILICON SUBSTRATES; STEP SURFACE; WAVELENGTH REGIONS; XPS; XPS ANALYSIS; XRD; ZINC OXIDE THIN FILMS;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CRYSTAL ATOMIC STRUCTURE; DEPOSITION; GLASS LASERS; MAGNETIC FILMS; NANOCRYSTALLINE SILICON; OPACITY; OXIDE FILMS; OXYGEN; PHOTORESISTS; PULSED LASER DEPOSITION; SEMICONDUCTING SILICON COMPOUNDS; STRUCTURAL PROPERTIES; SURFACE ROUGHNESS; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC; ZINC OXIDE;

PULSED LASERS;

EID: 77953138476     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.10.025     Document Type: Article

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