Surface analysis with high energy time-of-flight secondary ion mass spectrometry measured in parallel with PIXE and RBS

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 268, Issue 11-12, 2010, Pages 1714-1717

  Jones, Brian N ^a   Palitsin, Vladimir ^a   Webb, Roger ^a  

^a UNIVERSITY OF SURREY   (United Kingdom)

Author keywords

MeV ToF SIMS; PDMS; PIXE; RBS

Indexed keywords

ELECTRONIC ENERGY LOSS; HIGH ENERGY; ION VELOCITY; MOLECULAR IMAGES; MOLECULAR MAPS; PARTICLE INDUCED X-RAY EMISSION; PRIMARY IONS; RUTHERFORD BACK-SCATTERING; SECONDARY ION YIELD; SURFACE REGION; TIME OF FLIGHT SECONDARY ION MASS SPECTROMETRY; TOF SIMS;

AMINO ACIDS; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISSIPATION; ION BEAMS; IONS; MICROCHANNELS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY EMISSION; SPECTROMETRY; SURFACE ANALYSIS; TWO DIMENSIONAL;

SECONDARY ION MASS SPECTROMETRY;

EID: 77953130403     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2010.02.045     Document Type: Article

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