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Physical Review Letters

Volumn 104, Issue 20, 2010, Pages

Photoexfoliation of graphene from graphite: An Ab initio study

(3) Miyamoto, Yoshiyuki a,b Zhang, Hong c Tománek, David d

a NEC CORPORATION (Japan)

b JAPAN SCIENCE AND TECHNOLOGY AGENCY (Japan)

c SICHUAN UNIVERSITY (China)

d MICHIGAN STATE UNIVERSITY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

A-THERMAL; AB INITIO; AB INITIO STUDY; EXFOLIATION PROCESS; FEMTOSECOND LASER PULSE; GRAPHITE SURFACES; HIGH RATE; MOLECULAR DYNAMICS SIMULATIONS; SPEED-UPS; SUBSURFACE LAYER; TIME-DEPENDENT DENSITY; ULTRASHORT LASER PULSE;

ELECTRON ENERGY LEVELS; FULL WIDTH AT HALF MAXIMUM; GRAPHENE; GRAPHITE; MOLECULAR DYNAMICS; MONOLAYERS; PULSED LASER APPLICATIONS;

ULTRASHORT PULSES;

EID: 77953100009 PISSN: 00319007 EISSN: 10797114 Source Type: Journal
DOI: 10.1103/PhysRevLett.104.208302 Document Type: Article

Times cited : (88)

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