Investigation of microstructural properties of nitrogen doped ZnO thin films formed by magnetron sputtering on silicon substrate

Journal of Optoelectronics and Advanced Materials

Volumn 12, Issue 5, 2010, Pages 1045-1051

  Nicolescu, M ^a   Anastasescu, M ^a   Preda, S ^a   Calderon Moreno, J M ^a   Osiceanu, P ^a   Gartner, M ^a   Teodorescu, V S ^a,b   Maraloiu, A V ^a,b   Kampylafka, V ^a,c   Aperathitis, E ^a,c   Modreanu, M ^a,d  

^a ACADEMY OF ROMANIAN SCIENTISTS   (Romania)

^b NATIONAL INSTITUTE OF MATERIALS PHYSICS   (Romania)

^c INSTITUTE OF ELECTRONIC STRUCTURE AND LASER   (Greece)

^d UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

AFM; FTIR; Magnetron sputtering; N doped ZnO; SEM EDX; TEM SAED; XPS; XRD

Indexed keywords

ATOMIC FORCE MICROSCOPY; DOPING (ADDITIVES); ELECTRON DIFFRACTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAIN BOUNDARIES; II-VI SEMICONDUCTORS; MAGNETIC SEMICONDUCTORS; MAGNETRON SPUTTERING; METALLIC FILMS; MORPHOLOGY; NITROGEN; OXIDE MINERALS; RAPID THERMAL ANNEALING; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; SURFACE MORPHOLOGY; THIN FILMS; WIDE BAND GAP SEMICONDUCTORS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE; ZINC SULFIDE;

ENERGY DISPERSIVE X-RAY; FTIR; MICRO-STRUCTURAL PROPERTIES; N-DOPED ZNO; POST DEPOSITION TREATMENT; R.F. MAGNETRON SPUTTERING; SELECTED AREA ELECTRON DIFFRACTION; WURTZITE TYPE STRUCTURE;

SEMICONDUCTING ZINC COMPOUNDS;

EID: 77953056797     PISSN: 14544164     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (13)

1. G. E. Jellison, L. A. Boatner, Phys. Rev. B 58, 3586 (1998).
2. D. P.Norton, Y. W. Heo, M. P. Ivill, et al. Mater. Today 7, 34 (2004).
3. M. H. Huang, S.Mao, H.Feick, H.Yan, Y.Wu, H.Kind, E.Weber, R.Russo, P.Yang, Science 292, 1897 (2001).
4. H. Xu, X. Liu, D. Cui, M. Li, M. Jiang, Sensors and Actuatores B: Chemical 114, 301 (2006).
5. J. B. Baxter, E. S. Aydie, Solar Energy Materials and Solar Cells 90, 607 (2006).
6. E. M. C. Fortunato, P. M. C. Barquinha, A. C. M. B. G. Pimemtel, et al. Adv. Mater 17, 590 (2005).
7. M. Miyanchy, A. Nakajima, T. Watanabe, K. Hashimoto, Chem. Mater. 14, 2812 (2002).
8. Y. S. Kim, W. P. Tai, S. J. Shu, Thin Solid Films 491, 153 (2005).
9. D. Sebok, T. Szabo, I. Dekany, Appl. Surf. Science 255, 6953-6962 (2009).
10. S. T. Tan, B. J. Chen, X. W. Sun, X. Hu, X. H. Zhang, S. J. Chua, J. of Crystal Growth 281, 571 (2005).
11. R. Das, S. Ray, J. Phys. D: Appl. Phys. 36, 152-155 (2003).
12. V. S.Teodorescu, M.G. Blanchin, Microscopy and Microanalysis 15, 15 (2009).
13. Z. Wang, X.-F. Qian, J Yin, Z.-K. Zhu: J. Solid State Chem. 177, 2144 (2004).