Optical properties of TiO2 thin films prepared by chemical spray pyrolysis from aqueous solutions

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 7, Issue 3-4, 2010, Pages 933-936

  Ayouchi, R ^a   Casteleiro, C ^a   Schwarz, R ^a   Barrado, J R ^b   Martin F ^b  

^a INSTITUTO SUPERIOR TÉCNICO   (Portugal)

^b UNIVERSITY OF MÁLAGA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

ANATASE PHASE; ANNEALED FILMS; AQUEOUS SOLUTIONS; AS-DEPOSITED THIN FILMS; CHEMICAL SPRAY PYROLYSIS; CHEMICAL VAPOUR DEPOSITION; CONFORMAL COVERAGE; CRACK-FREE SURFACES; CRYSTALLINE FORM; CRYSTALLIZED FILMS; DEPOSITION TECHNIQUE; FUSED SILICA SUBSTRATES; GROWTH PARAMETERS; HIGHER TEMPERATURES; ISO-PROPOXIDE; LARGE-AREA DEPOSITION; LOW COSTS; OPTICAL PARAMETER; ORGANIC PRECURSOR; PHYSICAL MODEL; POLYCRYSTALLINE STRUCTURE; RESIDUAL CARBON; RUTILE PHASE; SEM IMAGE; SI(0 0 1); THERMAL OXIDATION; TIO;

AMORPHOUS MATERIALS; ANNEALING; COMPUTER OPERATING PROCEDURES; CRACKING (CHEMICAL); DEPOSITION; DEPTH PROFILING; FUSED SILICA; OXIDE MINERALS; REFRACTIVE INDEX; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR GROWTH; SILICA; SOLUTIONS; SPECTROSCOPIC ELLIPSOMETRY; SURFACE ROUGHNESS; THERMAL EVAPORATION; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

SPRAY PYROLYSIS;

EID: 77952576311     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200982895     Document Type: Conference Paper

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