Electron-beam-induced carbon contamination on silicon: Characterization using raman spectroscopy and atomic force microscopy

Microscopy and Microanalysis

Volumn 16, Issue 1, 2010, Pages 13-20

  Lau, Deborah ^a   Hughes, Anthony E ^a   Muster, Tim H ^a   Davis, Timothy J ^a   Glenn, A Matthew ^a  

^a CSIRO   (Australia)

Author keywords

Amorphous thin films; Carbon deposition; Electron microscopy; Raman spectroscopy

Indexed keywords

EID: 77952553443     PISSN: 14319276     EISSN: 14358115     Source Type: Journal    
DOI: 10.1017/S1431927609991206     Document Type: Article

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