Irradiation-damages in atmospheric plasma used in a resist ashing process for thin film transistors

Japanese Journal of Applied Physics

Volumn 48, Issue 3 PART 3, 2009, Pages

  Sato, Taiki ^a   Ueno, Akira ^a   Yara, Takuya ^b   Miyamoto, Eiji ^b   Uraoka, Yukiharu ^c   Kubota, Tomohiro ^a   Samukawa, Seiji ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b SEKISUI CHEMICAL CO LTD   (Japan)

^c NARA INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ASHING PROCESS; ATMOSPHERIC PLASMAS; ELECTRICAL CHARACTERISTIC; LIGHTLY DOPED DRAINS; OFF-CURRENT; ON-CURRENTS; ON-WAFER; SLIDE GLASS; SUBSTRATE SURFACE; UV FILTER; UV LIGHT; UV PHOTONS; UV WAVELENGTH;

DEGRADATION; IRRADIATION; PHOTONS; PLASMAS; THIN FILMS;

THIN FILM TRANSISTORS;

EID: 77952522587     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.48.03B009     Document Type: Article

References (6)

1. S. Kanazawa, M. Kogoma, T. Moriwaki, and S. Okazaki: J. Phys. D 21 (1988) 838.
2. S. Samukawa, Y. Ishikawa, S. Kumagai, and M. Okigawa: Jpn. J. Appl. Phys. 40 (2001) L1346.
3. T. Yara, K. Iwane, and M. Yuasa: Oyo Buturi 75 (2006) 456 [in Japanese].
4. H. Ohtake, B. Jinnai, Y. Suzuki, S. Soda, T. Shimmura, and S. Samukawa: J. Vac. Sci. Technol. B 25 (2007) 400.
5. M. Griggs: J. Chem. Phys. 49 (1968) 857.
6. H. R. Philipp: in Handbook of Optical Constants of Solids, ed. E. D. Palik (Academic Press, New York, 1985) p. 771.