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Volumn 48, Issue 4 PART 2, 2009, Pages
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Selective patterning of organic light-emitting diodes by physical vapor deposition of photosensitive materials
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Author keywords
[No Author keywords available]
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Indexed keywords
CO-EVAPORATED;
CROSSLINKER;
DEVICE CHARACTERISTICS;
EMISSIVE LAYERS;
ETHYLMETHACRYLATE;
FILM MORPHOLOGY;
HIGH RESISTANCE;
HOLE TRANSPORT LAYERS;
HOST MATERIALS;
NOVEL METHODS;
PHOTO PATTERNING;
PHOTO-INITIATOR;
PHOTOSENSITIVE LAYERS;
PHOTOSENSITIVE MATERIALS;
POST DEPOSITION ANNEALING;
RADICAL POLYMERIZATION;
SELECTIVE PATTERNING;
TETRAHYDROFURANS;
UV IRRADIATION;
ZINC ACRYLATE;
DEPOSITION;
ELECTRONIC EQUIPMENT;
LIGHT EMISSION;
LIGHT EMITTING DIODES;
LIGHT SENSITIVE MATERIALS;
ORGANIC SOLVENTS;
PHOTOPOLYMERIZATION;
PHOTORESISTS;
PHOTOSENSITIVITY;
PHYSICAL VAPOR DEPOSITION;
POLYMERIC FILMS;
ZINC;
ORGANIC LIGHT EMITTING DIODES (OLED);
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EID: 77952515814
PISSN: 00214922
EISSN: 13474065
Source Type: Journal
DOI: 10.1143/JJAP.48.04C163 Document Type: Article |
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Times cited : (9)
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References (10)
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